Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 6/20 | 0.94 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.94 |
| ▸ | BAX | Q07812 | 1/20 | 0.94 |
| ▸ | MEN1 | O00255 | 1/20 | 0.72 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.72 |
| ▸ | ESR1 | P03372 | 1/20 | 0.72 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.72 |
| ▸ | TSHR | P16473 | 1/20 | 0.71 |
| ▸ | CA1 | P00915 | 2/20 | 0.56 |
| ▸ | CA2 | P00918 | 2/20 | 0.56 |
| ▸ | CA12 | O43570 | 1/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.56 |
| ▸ | CA3 | P07451 | 1/20 | 0.56 |
| ▸ | CA4 | P22748 | 1/20 | 0.56 |
| ▸ | CA9 | Q16790 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.56 |
| ▸ | MMP3 | P08254 | 1/20 | 0.52 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.52 |
| ▸ | MAOA | P21397 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5376734 | 0.97 | LTA4H (1.00) | LTA4HNR1H2BAXMEN1KMT2A | |
| SCHEMBL74847 | 0.97 | LTA4H (1.00) | LTA4HNR1H2BAXMEN1KMT2A | |
| SCHEMBL5528852 | 0.97 | LTA4H (1.00) | LTA4HNR1H2BAXMEN1KMT2A | |
| Phenol SCHEMBL636047 | 0.95 | LTA4H (0.95) | LTA4HNR1H2BAXMEN1KMT2A | |
| SCHEMBL27714320 | 0.95 | LTA4H (0.95) | LTA4HNR1H2BAXMEN1KMT2A | |
| Phenol SCHEMBL5380064 | 0.95 | LTA4H (0.95) | LTA4HNR1H2BAXMEN1KMT2A | |
| Diphenylether SCHEMBL1319200 | 0.94 | LTA4H (0.84) | LTA4HNR1H2BAXMEN1KMT2A | |
| Diphenylether SCHEMBL21826729 | 0.94 | LTA4H (0.84) | LTA4HNR1H2BAXMEN1KMT2A | |
| Diphenylether SCHEMBL11315604 | 0.94 | LTA4H (0.84) | LTA4HNR1H2BAXMEN1KMT2A | |
| Diphenylether SCHEMBL27692212 | 0.94 | LTA4H (0.84) | LTA4HNR1H2BAXMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5516672-A | CONTAINING A BENZENE DERIVATIVE AS STABILIZER; MEDICAL DIAGNOSIS; STORAGE STABILITY | KONICA CORPORATION (JP) | 1996-05-14 | — | — | US | claimed |
| EP-0135016-B1 | PROCESS FOR THE STABILISATION OF POLY(PHENYLENE ETHER) SOLUTIONS | BASF Aktiengesellschaft (DE) | 1987-04-08 | — | — | EP | claimed |
| EP-0039890-B1 | METHOD FOR THE PREPARATION OF HYDROQUINONE MONO-PHENYL ETHERS | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-05-18 | — | — | EP | claimed |
| US-4374281-A | Process for the manufacture of hydroquinone-monophenyl ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-02-15 | — | — | US | claimed |
| US-4172959-A | Process for the manufacture of diphenyl ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-10-30 | — | — | US | claimed |
| JP-1308084-A | — | — | None | — | — | JP | disclosed |
| EP-3755675-B1 | ACCELERATED PEROXIDE-CURED RESIN COMPOSITIONS HAVING EXTENDED OPEN TIMES | ARKEMA INC (US) | 2026-05-13 | — | — | EP | disclosed |
| US-12486381-B2 | Accelerated peroxide-cured resin compositions having extended open times | ARKEMA INC. (US) | 2025-12-02 | — | — | US | disclosed |
| EP-3559153-B1 | EFFICIENT CURATIVE FOR FREE RADICALLY-CROSSLINKABLE POLYMERS | ARKEMA INC (US) | 2025-07-30 | — | — | EP | disclosed |
| US-20250231479-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | UIF (UNIVERSITY INDUSTRY FOUNDATION), YONSEI UNIVERSITY (KR) | 2025-07-17 | — | — | US | disclosed |
| US-20250231481-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-07-17 | — | — | US | disclosed |
| US-20250199399-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-06-19 | — | — | US | disclosed |
| EP-0039890-A1 | Method for the preparation of hydroquinone mono-phenyl ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-11-18 | — | — | EP | disclosed |
| US-4219457-A | ADHESION, EPOXY RESIN, OXYALKYLENE DERIVATIVE OF A PHENOL, AND ESTER | TORAY INDUSTRIES, INC. (JP) | 1980-08-26 | — | — | US | disclosed |
| US-4172959-A | Process for the manufacture of diphenyl ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-10-30 | — | — | US | disclosed |
| US-4172959-A | Process for the manufacture of diphenyl ethers | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-10-30 | — | — | US | disclosed |
| US-4167538-A | Resinous composition for surface-treating reinforcing fibers and surface-treating process | TORAY INDUSTRIES, INC. (JP) | 1979-09-11 | — | — | US | disclosed |
| US-4026859-A | AROMATIZATION CATALYST | HERCULES INCORPORATED (US) | 1977-05-31 | — | — | US | disclosed |
| US-4026860-A | AROMATIZATION CATALYST | HERCULES INCORPORATED (US) | 1977-05-31 | — | — | US | disclosed |
| US-4026861-A | AROMATIZATION CATALYST | HERCULES INCORPORATED (US) | 1977-05-31 | — | — | US | disclosed |