Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | TYR | P14679 | 1/20 | 0.39 |
| ▸ | ABL1 | P00519 | 1/20 | 0.39 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.39 |
| ▸ | BCR | P11274 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29876780 | 1.00 | ESR1 (0.47) | ESR1ESR2CYP1A2ALOX15HSD17B10 | |
| SCHEMBL14742461 | 0.89 | CYP1A2 (0.54) | ESR1ESR2CYP1A2HSD17B10CYP3A4 | |
| SCHEMBL14680504 | 0.87 | MCL1 (0.43) | ESR1ESR2CYP1A2HSD17B10MCL1 | |
| Methane SCHEMBL7938140 | 0.87 | CYP1A2 (0.52) | ESR1ESR2CYP1A2HSD17B10HIF1A | |
| SCHEMBL670670 | 0.79 | CYP1A2 (0.52) | ESR1ESR2CYP1A2ALOX15HSD17B10 | |
| SCHEMBL3212292 | 0.79 | PTPN22 (0.56) | ESR1ESR2CYP1A2ALOX15HSD17B10 | |
| SCHEMBL29655555 | 0.79 | PTPN22 (0.56) | ESR1ESR2CYP1A2ALOX15HSD17B10 | |
| SCHEMBL29085467 | 0.79 | CYP17A1 (0.46) | ESR1ESR2CYP1A2CYP3A4MCL1 | |
| SCHEMBL13316750 | 0.77 | ESR1 (0.42) | ESR1ESR2CYP1A2MCL1 | |
| SCHEMBL2770679 | 0.77 | CYP1A2 (0.46) | ESR1ESR2CYP1A2ALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1805561-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | MERCK PATENT GMBH (DE) | 2018-10-24 | — | — | EP | claimed |
| CN-105431780-B | Resist underlayer film forming composition containing polymer containing nitrogen-containing cyclic compound | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| US-10113083-B2 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-10-30 | — | — | US | disclosed |
| EP-1805561-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | MERCK PATENT GMBH (DE) | 2018-10-24 | — | — | EP | disclosed |
| US-20160186006-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH CONTAINS NITROGEN-CONTAINING RING COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-2343597-B1 | Use of an underlayer coating forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-8778876-B2 | Small-molecule inhibitors of Dengue and West Nile virus proteases | THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM (US) | 2014-07-15 | — | — | US | disclosed |
| US-8778876-B2 | Small-molecule inhibitors of Dengue and West Nile virus proteases | THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM (US) | 2014-07-15 | — | — | US | disclosed |
| CN-101550265-B | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL IND LTD | 2014-04-16 | — | — | CN | disclosed |
| EP-1780600-B1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | NISSAN CHEMICAL IND LTD (JP) | 2014-02-26 | — | — | EP | disclosed |
| EP-1805561-A2 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ Electronic Materials USA Corp. (US) | 2007-07-11 | — | — | EP | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| EP-1780600-A1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| WO-2006030320-A2 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2006-03-23 | — | — | WO | disclosed |
| US-20060058468-A1 | Antireflective compositions for photoresists | MERCK PATENT GMBH (DE) | 2006-03-16 | — | — | US | disclosed |
| US-20060057501-A1 | Antireflective compositions for photoresists | AZ ELECTRONIC MATERIALS USA CORP. | 2006-03-16 | — | — | US | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |