SCHEMBL125239

SCHEMBL125239

CCCCN(CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA9 Q16790 2/20 0.34
USP2 O75604 1/20 0.33
MAPT P10636 1/20 0.33
TSHR P16473 1/20 0.33
GAA P10253 1/20 0.33
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP8 P22894 1/20 0.33
FAAH O00519 8/20 0.31
CES1 P23141 5/20 0.30
CES2 O00748 3/20 0.30
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
KMT2A Q03164 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15225053 1.00 CA12 (0.34) CA12CA1CA9USP2MAPT
SCHEMBL15225051 0.94 FAAH (0.35) CA12CA1CA9USP2MAPT
SCHEMBL15224856 0.94 FAAH (0.35) CA12CA1CA9USP2MAPT
SCHEMBL15224750 0.94 CA12 (0.36) CA12CA1CA9MAPTGAA
SCHEMBL15225071 0.90 USP2 (0.35) USP2MAPTTSHRGAA
SCHEMBL15226121 0.90 USP2 (0.35) USP2MAPTTSHRGAA
SCHEMBL15224966 0.90 USP2 (0.35) USP2MAPTTSHRGAA
SCHEMBL15224962 0.90 USP2 (0.35) USP2MAPTTSHRGAA
SCHEMBL15225324 0.89 CA12 (0.41) CA12CA1CA9GAAMMP1
SCHEMBL15224945 0.89 FAAH (0.37) CA12CA1CA9MAPTFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2496588-B1 Urethaneacrylate with high refraction index and reduced double-bond density COVESTRO DEUTSCHLAND AG (DE) 2017-01-11 EP disclosed
EP-2531892-B1 USE OF A PHOTOPOLYMER FORMULATION WITH TRIAZINE-BASED WRITING MONOMERS COVESTRO DEUTSCHLAND AG (DE) 2016-01-27 EP disclosed
EP-2497085-B1 Method for producing a holographic film BAYER IP GMBH (DE) 2014-02-12 EP disclosed
EP-2497080-B1 Method for producing a holographic film BAYER IP GMBH (DE) 2013-12-25 EP disclosed
EP-2497084-B1 Selection method for additives in photopolymers BAYER IP GMBH (DE) 2013-12-25 EP disclosed
EP-2497083-B1 Photopolymer formulation with various comonomers BAYER IP GMBH (DE) 2013-12-25 EP disclosed
EP-2497081-B1 Method for producing holographic media BAYER IP GMBH (DE) 2013-10-16 EP disclosed
EP-2497082-B1 Fluorurethane as additive in a photopolymer formulation BAYER IP GMBH (DE) 2013-09-04 EP disclosed
EP-2531892-A1 PHOTOPOLYMER FORMULATION HAVING TRIAZINE-BASED WRITING MONOMERS Bayer Intellectual Property GmbH (DE) 2012-12-12 EP disclosed
EP-2497080-A1 METHOD FOR PRODUCING A HOLOGRAPHIC FILM Bayer MaterialScience AG (DE) 2012-09-12 EP disclosed
EP-2497084-A1 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS Bayer MaterialScience AG (DE) 2012-09-12 EP disclosed
EP-2496588-A1 URETHANE ACRYLATE HAVING A HIGH REFRACTIVE INDEX AND REDUCED DOUBLE BOND DENSITY Bayer MaterialScience AG (DE) 2012-09-12 EP disclosed
EP-2317511-B1 Photopolymer formulations with adjustable mechanical module Guv BAYER MATERIALSCIENCE AG (DE) 2012-03-07 EP disclosed
WO-2011095441-A1 PHOTOPOLYMER FORMULATION HAVING TRIAZINE-BASED WRITING MONOMERS BAYER MATERIALSCIENCE AG (DE) 2011-08-11 WO disclosed
WO-2011054793-A1 METHOD FOR PRODUCING HOLOGRAPHIC MEDIA BAYER MATERIALSCIENCE AG (DE) 2011-05-12 WO disclosed
WO-2011054749-A1 PHOTOPOLYMER FORMULATIONS HAVING THE ADJUSTABLE MECHANICAL MODULUS GUV BAYER MATERIALSCIENCE AG (DE) 2011-05-12 WO disclosed
WO-2011054791-A1 METHOD FOR PRODUCING A HOLOGRAPHIC FILM BAYER MATERIALSCIENCE AG (DE) 2011-05-12 WO disclosed
WO-2011054792-A1 URETHANE ACRYLATE HAVING A HIGH REFRACTIVE INDEX AND REDUCED DOUBLE BOND DENSITY BAYER MATERIALSCIENCE AG (DE) 2011-05-12 WO disclosed
WO-2011054796-A1 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS BAYER MATERIALSCIENCE AG (DE) 2011-05-12 WO disclosed
EP-2317511-A1 Photopolymer formulations with adjustable mechanical module Guv Bayer MaterialScience AG (DE) 2011-05-04 EP disclosed