Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 15/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.36 |
| ▸ | APP | P05067 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 6/20 | 0.33 |
| ▸ | MEN1 | O00255 | 5/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.33 |
| ▸ | PKM | P14618 | 2/20 | 0.33 |
| ▸ | CRHBP | P24387 | 2/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 4/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12545104 | 1.00 | ALDH1A1 (0.36) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL13397808 | 1.00 | ALDH1A1 (0.36) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL12715127 | 0.99 | ALDH1A1 (0.35) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL12715212 | 0.99 | ALDH1A1 (0.35) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL12216526 | 0.94 | ALDH1A1 (0.37) | ALDH1A1KDM4ENPSR1MEN1KMT2A | |
| SCHEMBL12216525 | 0.93 | ALDH1A1 (0.35) | ALDH1A1KDM4ENPSR1MEN1KMT2A | |
| SCHEMBL12715157 | 0.92 | ALDH1A1 (0.34) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL14441991 | 0.92 | ALDH1A1 (0.32) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL14441992 | 0.92 | ALDH1A1 (0.32) | ALDH1A1KDM4EAPPNPSR1MEN1 | |
| SCHEMBL12715152 | 0.92 | ALDH1A1 (0.34) | ALDH1A1KDM4EAPPNPSR1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8574469-B2 | Processing method and manufacturing method for optical component | FUJIFILM CORPORATION (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8445186-B2 | Recessed portion forming method, method for manufacturing pit-projection product, method for manufacturing light emitting element, and method for manufacturing optical element | FUJIFILM CORPORATION (JP) | 2013-05-21 | — | — | US | disclosed |
| US-8309296-B2 | Method for processing workpiece with photoresist layer | FUJIFILM CORPORATION (JP) | 2012-11-13 | — | — | US | disclosed |
| US-8309296-B2 | Method for processing workpiece with photoresist layer | FUJIFILM CORPORATION (JP) | 2012-11-13 | — | — | US | disclosed |
| US-20110128522-A1 | METHOD FOR MANUFACTURING A PATTERNED MEMBER AND PROCESSING APPARATUS USING ELECTROMAGNETIC BEAM | FUJIFILM CORPORATION (JP) | 2011-06-02 | — | — | US | disclosed |
| US-20110128522-A1 | METHOD FOR MANUFACTURING A PATTERNED MEMBER AND PROCESSING APPARATUS USING ELECTROMAGNETIC BEAM | FUJIFILM CORPORATION (JP) | 2011-06-02 | — | — | US | disclosed |
| US-20110129634-A1 | PATTERNED MEMBER AND METHOD FOR MANUFACTURING THE PATTERNED MEMBER | FUJIFILM CORPORATION (JP) | 2011-06-02 | — | — | US | disclosed |
| US-20110037824-A1 | LASER EXPOSURE METHOD, PHOTORESIST LAYER PROCESSING METHOD AND METHOD FOR MANUFACTURING PATTERNED CASTING | FUJIFILM CORPORATION (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110037824-A1 | LASER EXPOSURE METHOD, PHOTORESIST LAYER PROCESSING METHOD AND METHOD FOR MANUFACTURING PATTERNED CASTING | FUJIFILM CORPORATION (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110003255-A1 | METHOD FOR PROCESSING WORKPIECE WITH PHOTORESIST LAYER | FUJIFILM CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| US-20100236584-A1 | METHOD FOR CLEANING HEAT MODE TYPE RECORDING MATERIAL LAYER, METHOD FOR MANUFACTURING PIT-PROJECTION PRODUCT, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100233631-A1 | RECESSED PORTION FORMING METHOD, METHOD FOR MANUFACTURING PIT-PROJECTION PRODUCT, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100104985-A1 | COMPOUND FOR PHOTORESIST, PHOTORESIST LIQUID, AND ETCHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20100104985-A1 | COMPOUND FOR PHOTORESIST, PHOTORESIST LIQUID, AND ETCHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20090261501-A1 | MANUFACTURING METHOD FOR A STAMPER AND MANUFACTURING METHOD FOR AN OPTICAL INFORMATION RECORDING MEDIUM USING THE STAMPER | FUJIFILM CORPORATION (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20090261501-A1 | MANUFACTURING METHOD FOR A STAMPER AND MANUFACTURING METHOD FOR AN OPTICAL INFORMATION RECORDING MEDIUM USING THE STAMPER | FUJIFILM CORPORATION (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20080182059-A1 | Optical Recording Medium and Method of Producing the Same | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20080182059-A1 | Optical Recording Medium and Method of Producing the Same | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | disclosed |
| US-20070190283-A1 | Optical information recording medium and manufacturing method thereof | FUJIFILM CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1804242-A1 | OPTICAL INFORMATION RECORDING MEDIUM AND METHOD FOR MANUFACTURING SAME | FUJIFILM Corporation (JP) | 2007-07-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100104985-A1 | COMPOUND FOR PHOTORESIST, PHOTORESIST LIQUID, AND ETCHING METHOD USING THE SAME | PYCR1, STK10, STK4 | ALDH1A1 3885/4885KDM4E 616/4885APP 44/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.