SCHEMBL12550784

SCHEMBL12550784

COC(=O)OCCN1CCS(=O)(=O)CC1

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC29A1 Q99808 1/20 0.37
HRH3 Q9Y5N1 1/20 0.37
ALDH1A1 P00352 2/20 0.36
PKM P14618 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
RAB9A P51151 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
LMNA P02545 1/20 0.33
HPGD P15428 1/20 0.33
SLC18A3 Q16572 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14500265 0.85 SLC29A1 (0.46) SLC29A1HRH3ALDH1A1NPSR1MEN1
SCHEMBL12550629 0.82 SLC18A3 (0.48) SLC29A1HRH3ALDH1A1NPSR1RAB9A
SCHEMBL12550781 0.82 ALDH1A1 (0.36) SLC29A1HRH3ALDH1A1NPSR1RAB9A
SCHEMBL12014424 0.82 KMT2A (0.46) NPSR1MEN1KMT2A
SCHEMBL15499950 0.81 HCAR2 (0.39) SLC29A1HRH3ALDH1A1PKMNPSR1
SCHEMBL15512425 0.81 HCAR2 (0.39) SLC29A1HRH3ALDH1A1PKMNPSR1
SCHEMBL12014419 0.80 KMT2A (0.49) NPSR1MEN1KMT2AHPGD
SCHEMBL23867026 0.80 RAB9A (0.37) SLC29A1HRH3ALDH1A1NPSR1RAB9A
SCHEMBL25475330 0.80 RAB9A (0.37) SLC29A1HRH3ALDH1A1NPSR1RAB9A
SCHEMBL12550778 0.80 SLC29A1 (0.35) SLC29A1HRH3ALDH1A1NPSR1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828641-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-09 US disclosed
US-8828641-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-09 US disclosed
US-20110129777-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-06-02 US disclosed
US-20110129777-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-06-02 US disclosed