Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | EEF2K | O00418 | 2/20 | 0.41 |
| ▸ | EEF2 | P13639 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | PLK4 | O00444 | 1/20 | 0.41 |
| ▸ | JAK2 | O60674 | 1/20 | 0.41 |
| ▸ | EGFR | P00533 | 1/20 | 0.41 |
| ▸ | TYK2 | P29597 | 1/20 | 0.41 |
| ▸ | FLT3 | P36888 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ITK | Q08881 | 1/20 | 0.41 |
| ▸ | PIM2 | Q9P1W9 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5297200 | 0.86 | EEF2K (0.50) | CYP2D6CYP2C19EEF2KEEF2MEN1 | |
| SCHEMBL5300312 | 0.86 | EEF2K (0.50) | CYP2D6CYP2C19EEF2KEEF2MEN1 | |
| Hydrochloric Acid SCHEMBL16144878 | 0.85 | MEN1 (0.49) | CYP2D6CYP2C19TP53EEF2KEEF2 | |
| Hydrochloric Acid SCHEMBL1072630 | 0.85 | MEN1 (0.49) | CYP2D6CYP2C19TP53EEF2KEEF2 | |
| Bromide SCHEMBL11692702 | 0.83 | TP53 (0.48) | CYP2D6CYP2C19TP53EEF2KEEF2 | |
| SCHEMBL10730872 | 0.81 | TDP1 (0.48) | CYP2D6CYP2C19MEN1KMT2AKCNH2 | |
| SCHEMBL12558267 | 0.80 | KDM4E (0.38) | TP53MEN1KMT2AKCNH2ALDH1A1 | |
| SCHEMBL9253184 | 0.79 | RAB9A (0.38) | CYP2D6CYP2C19MEN1KMT2AKCNH2 | |
| SCHEMBL19700931 | 0.77 | CYP2D6 (0.43) | CYP2D6CYP2C19TP53EEF2KEEF2 | |
| Hydrochloric Acid SCHEMBL11725090 | 0.77 | KDM4E (0.45) | CYP2D6CYP2C19MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230168582-A1 | COMPOSITION FOR FORMING RESIST UNDERLYING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-01 | — | — | US | disclosed |
| US-20230152700-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-8864894-B2 | Resist underlayer film forming composition containing silicone having onium group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-21 | — | — | US | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | SRR, KDM2B, MSR1 | CYP2D6 3670/4885CYP2C19 2339/4885TP53 2783/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.