Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.65 |
| ▸ | GAA | P10253 | 2/20 | 0.65 |
| ▸ | USP2 | O75604 | 1/20 | 0.65 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.65 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.60 |
| ▸ | MAPT | P10636 | 2/20 | 0.60 |
| ▸ | NPC1 | O15118 | 1/20 | 0.60 |
| ▸ | TP53 | P04637 | 1/20 | 0.60 |
| ▸ | HPGD | P15428 | 1/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.60 |
| ▸ | CES2 | O00748 | 1/20 | 0.55 |
| ▸ | CA12 | O43570 | 3/20 | 0.53 |
| ▸ | CA1 | P00915 | 3/20 | 0.53 |
| ▸ | CA2 | P00918 | 3/20 | 0.53 |
| ▸ | CA7 | P43166 | 3/20 | 0.53 |
| ▸ | CA9 | Q16790 | 3/20 | 0.53 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29450505 | 1.00 | MEN1 (0.65) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL2053270 | 0.89 | HDAC1 (0.58) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL10735111 | 0.88 | MEN1 (0.81) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL7717195 | 0.86 | CA12 (0.55) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL93420 | 0.86 | MEN1 (0.78) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL29375096 | 0.86 | MEN1 (0.78) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL10354488 | 0.84 | MEN1 (0.75) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL16993471 | 0.84 | MEN1 (0.59) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL10350386 | 0.82 | MEN1 (0.79) | MEN1KMT2AGAAUSP2KEAP1 | |
| SCHEMBL3275646 | 0.82 | MEN1 (0.67) | MEN1KMT2AGAAUSP2KEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114479735-A | Cationic UV curing adhesive and preparation method and application thereof | 张河远 | 2022-05-13 | — | — | CN | claimed |
| CN-114137795-A | Photoresist composition and application thereof | 广东粤港澳大湾区黄埔材料研究院 | 2022-03-04 | — | — | CN | claimed |
| WO-2024241686-A1 | VINYL POLYMER, AND ACTIVE ENERGY RAY-CURABLE COMPOSITION CONTAINING SAME | 東亞合成株式会社 | 2024-11-28 | — | — | WO | disclosed |
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| CN-114479735-A | Cationic UV curing adhesive and preparation method and application thereof | 张河远 | 2022-05-13 | — | — | CN | disclosed |
| US-20220146939-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11287741-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2022-03-29 | — | — | US | disclosed |
| CN-114137795-A | Photoresist composition and application thereof | 广东粤港澳大湾区黄埔材料研究院 | 2022-03-04 | — | — | CN | disclosed |
| CN-114031736-A | Modified phenolic resin for photoresist, preparation method thereof and photoresist composition | 广东粤港澳大湾区黄埔材料研究院 | 2022-02-11 | — | — | CN | disclosed |
| US-20210311396-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2021-10-07 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |
| US-4015017-A | Certain biphenyl derivatives used to treat disorders caused by increased capillary permeability | LABORATOIRES PHARMASCIENCE (FR) | 1977-03-29 | — | — | US | disclosed |