Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | PRNP | P04156 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | PDE10A | Q9Y233 | 3/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | DAO | P14920 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11184414 | 0.88 | KDM4E (0.52) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL29599456 | 0.87 | KDM4E (0.68) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| Benzene SCHEMBL10558251 | 0.87 | KDM4E (0.68) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL70004 | 0.87 | KDM4E (0.68) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL7814623 | 0.87 | KMT2A (0.47) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| Hydrochloric Acid SCHEMBL21173958 | 0.85 | KDM4E (0.65) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL31436571 | 0.85 | KDM4E (0.65) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| Fluoride SCHEMBL29599355 | 0.82 | KDM4E (0.62) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL4556957 | 0.80 | HSD17B10 (0.45) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL25177897 | 0.80 | KDM4E (0.60) | KDM4EALDH1A1MEN1KMT2ACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105237337-A | Novel synthesis method for 5-[10-(9-carbosyl anthryl)]-isophthalic acid | UNIV ZUNYI MEDICAL | 2016-01-13 | — | — | CN | claimed |
| US-11372330-B2 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| CN-105431780-B | Resist underlayer film forming composition containing polymer containing nitrogen-containing cyclic compound | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| US-10113083-B2 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-10-30 | — | — | US | disclosed |
| US-20160186006-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH CONTAINS NITROGEN-CONTAINING RING COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| CN-105237337-A | Novel synthesis method for 5-[10-(9-carbosyl anthryl)]-isophthalic acid | UNIV ZUNYI MEDICAL | 2016-01-13 | — | — | CN | disclosed |
| WO-2015132592-A1 | NOVEL ISOXAZOLINES AND THEIR USE IN CONTROLLING PESTS | NORBROOK LABORATORIES LIMITED (GB) | 2015-09-11 | — | — | WO | disclosed |
| WO-2015132592-A1 | NOVEL ISOXAZOLINES AND THEIR USE IN CONTROLLING PESTS | NORBROOK LABORATORIES LIMITED (GB) | 2015-09-11 | — | — | WO | disclosed |
| EP-2343597-B1 | Use of an underlayer coating forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| CN-1830202-A | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2006-09-06 | — | — | CN | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| CN-1768306-A | Underlayer coating forming composition for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL IND LTD (JP) | 2006-05-03 | — | — | CN | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
| CN-1723418-A | Composition for forming antireflection film for lithography | NISSAN CHEMICAL IND LTD (JP) | 2006-01-18 | — | — | CN | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |