SCHEMBL70004

SCHEMBL70004

O=C(O)c1c2ccccc2c(C(=O)O)c2ccccc12

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.68
ALDH1A1 P00352 2/20 0.68
HPGD P15428 2/20 0.68
HSD17B10 Q99714 2/20 0.68
MEN1 O00255 1/20 0.68
CYP1A2 P05177 1/20 0.68
GLA P06280 1/20 0.68
CYP2C19 P33261 1/20 0.68
KMT2A Q03164 1/20 0.68
TSHR P16473 3/20 0.50
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA7 P43166 1/20 0.50
CA9 Q16790 1/20 0.50
CA14 Q9ULX7 1/20 0.50
DAO P14920 1/20 0.50
NAPRT Q6XQN6 1/20 0.50
ALOX15 P16050 1/20 0.50
TDP1 Q9NUW8 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29599456 1.00 KDM4E (0.68) KDM4EALDH1A1HPGDHSD17B10MEN1
Benzene SCHEMBL10558251 1.00 KDM4E (0.68) KDM4EALDH1A1HPGDHSD17B10MEN1
Hydrochloric Acid SCHEMBL21173958 0.97 KDM4E (0.65) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL31436571 0.97 KDM4E (0.65) KDM4EALDH1A1HPGDHSD17B10MEN1
Fluoride SCHEMBL29599355 0.94 KDM4E (0.62) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL25177897 0.92 KDM4E (0.60) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL54422 0.91 KDM4E (0.58) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL2477681 0.89 HSD17B10 (0.58) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL31386574 0.88 KDM4E (0.56) KDM4EALDH1A1HPGDHSD17B10MEN1
SCHEMBL31441237 0.88 KDM4E (0.56) KDM4EALDH1A1HPGDHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 462 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4285943-B1 SILICONE PATCH COMPRISING METAL-ORGANIC FRAMEWORK AND SILICONE COMPOSITION SEOUL NAT UNIV HOSPITAL (KR) 2026-03-18 EP claimed
US-20250066641-A1 POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-02-27 US claimed
US-20240269659-A1 FRUSTRATED LEWIS PAIR-IMPREGNATED POROUS MATERIALS AND USES THEREOF UNIVERSITY OF SOUTH FLORIDA 2024-08-15 US claimed
EP-4397399-A2 MEMBRANES COMPRISING A LAYER OF METAL ORGANIC FRAMEWORK PARTICLES G2O Water Technologies Limited (GB) 2024-07-10 EP claimed
US-20240216586-A1 SILICONE PATCH COMPRISING METAL-ORGANIC FRAMEWORK AND SILICONE COMPOSITION SOOKMYUNG WOMEN'S UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2024-07-04 US claimed
CN-117894971-B Glassy metal organic framework material modified ternary positive electrode material, and preparation method and application thereof 中南大学 2024-06-04 CN claimed
CN-117894971-A Glassy metal organic framework material modified ternary positive electrode material, and preparation method and application thereof 中南大学 2024-04-16 CN claimed
WO-2024019398-A1 METHOD FOR PREPARING METAL-ORGANIC FRAMEWORK WITH LOW AMOUNT OF IMPURITIES WITHOUT WASHING, AND METAL-ORGANIC FRAMEWORK 숙명여자대학교산학협력단 2024-01-25 WO claimed
WO-2024019401-A1 METAL ORGANIC COMPOSITE PARTICLES CAPABLE OF ADSORBING, STORING, OR RELEASING TWO OR MORE TYPES OF FUNCTIONAL SUBSTANCES AND COMPOSITION COMPRISING SAME 숙명여자대학교산학협력단 2024-01-25 WO claimed
CN-117417561-A Low dielectric constant material film and preparation method thereof 华中科技大学 2024-01-19 CN claimed
EP-2739992-A1 DIRECT DETECTORS FOR IONIZING RADIATIONS, AND METHODS FOR PRODUCING SUCH DETECTORS Alma Mater Studiorum -Universita' di Bologna (IT) 2014-06-11 EP claimed
WO-2013017915-A1 DIRECT DETECTORS FOR IONIZING RADIATIONS, AND METHODS FOR PRODUCING SUCH DETECTORS ALMA MATER STUDIORUM UNIVERSITA DI BOLOGNA (IT) 2013-02-07 WO claimed
US-20090130384-A1 Chip Provided with film Having Hole Pattern with the Use of Thermoresponsive Polymer and Method of Producing the Same TOYAMA PREFECTURE (JP) 2009-05-21 US claimed
EP-1840650-B1 Positive type radiation-sensitive resin composition JSR CORP (JP) 2009-03-18 EP claimed
EP-1942179-A1 CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME Toyama Prefecture (JP) 2008-07-09 EP claimed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US claimed
EP-1840650-A1 Positive type radiation-sensitive resin composition JSR Corporation (JP) 2007-10-03 EP claimed
US-20060223010-A1 Positive type radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-05 US claimed
US-6544717-B2 Antireflective coating TOKYO OHKA KOGYO CO., LTD. (JP) 2003-04-08 US claimed
US-20010018163-A1 Undercoating composition for photolithographic resist TOKYO OHKA KOGYO CO., LTD. (JP) 2001-08-30 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240216586-A1 SILICONE PATCH COMPRISING METAL-ORGANIC FRAMEWORK AND SILICONE COMPOSITION CUTA, SMAD3, POF1B KDM4E 1339/4885ALDH1A1 3604/4885HPGD 4371/4885
US-20240269659-A1 FRUSTRATED LEWIS PAIR-IMPREGNATED POROUS MATERIALS AND USES THEREOF LPO, GPX4, NCF1 KDM4E 4308/4885ALDH1A1 2326/4885HPGD 671/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.