Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 5/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.30 |
| ▸ | ABCB11 | O95342 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
| ▸ | ITGB2 | P05107 | 2/20 | 0.30 |
| ▸ | ICAM1 | P05362 | 2/20 | 0.30 |
| ▸ | PGR | P06401 | 2/20 | 0.30 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.30 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.30 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | ITGAL | P20701 | 2/20 | 0.30 |
| ▸ | TACR2 | P21452 | 2/20 | 0.30 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.30 |
| ▸ | ADORA1 | P30542 | 2/20 | 0.30 |
| ▸ | AGTR1 | P30556 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15800172 | 0.89 | PPARG (0.31) | — | |
| SCHEMBL22402809 | 0.88 | — | — | |
| SCHEMBL10203817 | 0.82 | — | — | |
| SCHEMBL785961 | 0.82 | HMGCR (0.33) | HMGCR | |
| SCHEMBL9973372 | 0.81 | HMGCR (0.34) | HMGCRKDM4EABCB11PGRABCB1 | |
| SCHEMBL17853800 | 0.80 | HMGCR (0.34) | HMGCRKDM4EABCB11LMNAITGB2 | |
| SCHEMBL16591147 | 0.80 | HMGCR (0.31) | HMGCR | |
| SCHEMBL9608731 | 0.80 | HMGCR (0.31) | HMGCR | |
| SCHEMBL10115873 | 0.80 | — | — | |
| SCHEMBL18022201 | 0.79 | HMGCR (0.34) | HMGCRKDM4EABCB11LMNAITGB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9081279-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2015-07-14 | — | — | US | disclosed |
| US-8741537-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20140134541-A1 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8642253-B2 | Resist composition for negative tone development and pattern forming method using the same | FUJIFILM Incorporated (JP) | 2014-02-04 | — | — | US | disclosed |
| US-7947421-B2 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJIFILM CORPORATION (JP) | 2011-05-24 | — | — | US | disclosed |
| US-20110045413-A1 | RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-7842452-B2 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2010-11-30 | — | — | US | disclosed |
| US-20090123880-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |