⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12628451 | 0.88 | HMGCR (0.33) | — | |
| SCHEMBL15800172 | 0.85 | PPARG (0.31) | — | |
| SCHEMBL18845062 | 0.82 | NLRP3 (0.31) | — | |
| SCHEMBL22402806 | 0.81 | — | — | |
| SCHEMBL9973372 | 0.81 | HMGCR (0.34) | — | |
| SCHEMBL18844965 | 0.81 | — | — | |
| SCHEMBL19261126 | 0.80 | — | — | |
| SCHEMBL10203817 | 0.79 | — | — | |
| SCHEMBL10115873 | 0.79 | — | — | |
| SCHEMBL18845193 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11009793-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-18 | — | — | US | disclosed |
| US-20200283400-A1 | EPOXY COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |