SCHEMBL12646807

SCHEMBL12646807

CC(=O)NCCN1C(=O)NC(C)(C)C1=O

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.53
▸ POLB P06746 1/20 0.52
▸ ALDH1A1 P00352 4/20 0.44
▸ PADI4 Q9UM07 1/20 0.43
▸ FPR2 P25090 1/20 0.43
▸ MEN1 O00255 2/20 0.42
▸ MTNR1A P48039 1/20 0.42
▸ MTNR1B P49286 1/20 0.42
▸ LMNA P02545 1/20 0.42
▸ TSHR P16473 1/20 0.42
▸ PLA2G7 Q13093 1/20 0.41
▸ PDE4A P27815 1/20 0.41
▸ PDE4B Q07343 1/20 0.41
▸ PDE4C Q08493 1/20 0.41
▸ PDE4D Q08499 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13924638 0.84 KMT2A (0.47) KMT2APOLBALDH1A1PADI4FPR2
SCHEMBL10755881 0.84 KMT2A (0.50) KMT2APOLBALDH1A1PADI4FPR2
SCHEMBL17068923 0.81 KMT2A (0.50) KMT2APOLBALDH1A1PADI4FPR2
SCHEMBL11677768 0.78 POLB (0.74) KMT2APOLBALDH1A1PADI4MEN1
SCHEMBL16256882 0.77 KMT2A (0.58) KMT2APOLBALDH1A1PADI4FPR2
SCHEMBL24796374 0.77 KMT2A (0.54) KMT2APOLBALDH1A1PADI4FPR2
SCHEMBL9809600 0.74 POLB (0.63) KMT2APOLBALDH1A1PADI4MEN1
SCHEMBL11694927 0.74 POLB (0.68) KMT2APOLBALDH1A1PADI4LMNA
SCHEMBL8165986 0.74 KMT2A (0.68) KMT2APOLBALDH1A1PADI4MEN1
SCHEMBL6113379 0.73 KMT2A (0.53) KMT2APOLBALDH1A1PADI4FPR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210063880-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING SAME, COMPOUND AND RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-04 — — US disclosed
US-20200057370-A1 COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-02-20 — — US disclosed
EP-3605227-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING SAME, AND COMPOUND AND RESIN The School Corporation Kansai University (JP) 2020-02-05 — — EP disclosed
WO-2011050442-A1 GALLOTANNIC COMPOUNDS FOR LITHOGRAPHIC PRINTING PLATE COATING COMPOSITIONS MYLAN GROUP (VN) 2011-05-05 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200057370-A1 COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME CROCC, BICRA, TTC14 KMT2A 2178/4885POLB 460/4885ALDH1A1 3973/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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