Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | CASP3 | P42574 | 1/20 | 0.38 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.38 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.38 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | TYK2 | P29597 | 3/20 | 0.33 |
| ▸ | PTGES | O14684 | 1/20 | 0.33 |
| ▸ | JAK2 | O60674 | 1/20 | 0.33 |
| ▸ | TTR | P02766 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1104303 | 0.91 | PTGES (0.40) | NPC1RAB9ACASP3SENP8SENP7 | |
| SCHEMBL125432 | 0.79 | TSHR (0.39) | LMNAJAK2CYP3A4TSHRCCNB2 | |
| SCHEMBL124986 | 0.76 | CYP3A4 (0.32) | CYP3A4TSHRCCNB2CCNE2CDK1 | |
| SCHEMBL12936837 | 0.73 | — | — | |
| SCHEMBL12964381 | 0.73 | EGLN2 (0.35) | — | |
| SCHEMBL10203915 | 0.72 | RAB9A (0.44) | NPC1RAB9ACASP3SENP8SENP7 | |
| SCHEMBL23911671 | 0.72 | NPC1 (0.49) | NPC1RAB9ACASP3SENP8SENP7 | |
| SCHEMBL126470 | 0.69 | RAB9A (0.37) | NPC1RAB9AHRH4HTTSMN1; SMN2 | |
| SCHEMBL11983266 | 0.69 | — | — | |
| SCHEMBL4533328 | 0.69 | MAPT (0.32) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 260 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1657286-B1 | Radiation curable ink jet ink, comprising a polymerisation initiation sensitising dye | FUJIFILM CORP (JP) | 2018-07-04 | — | — | EP | disclosed |
| EP-2006738-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2017-09-06 | — | — | EP | disclosed |
| EP-1832633-B1 | Ink-jet recording ink set and ink-jet recording method | FUJIFILM CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| EP-1905608-B2 | Ink jet recording method and ink jet recording device | FUJIFILM CORP (JP) | 2016-11-23 | — | — | EP | disclosed |
| US-9032876-B2 | Lithographic printing plate precursor, lithographic printing plate platemaking method, and polymerizable monomer | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-8714088-B2 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2343195-B1 | LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POLYMERIZABLE MONOMER | FUJIFILM CORP (JP) | 2014-01-29 | — | — | EP | disclosed |
| US-8541063-B2 | Undercoat solution, ink-jet recording method and ink-jet recording device | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541063-B2 | Undercoat solution, ink-jet recording method and ink-jet recording device | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8426102-B2 | Lithographic printing plate precursor and plate making method | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |
| US-6912089-B2 | Optical diffusion film and process of producing optical diffusion film | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-28 | — | — | US | disclosed |
| EP-1213600-B1 | Optical diffusion film and process of producing optical diffusion film | FUJI PHOTO FILM CO LTD (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20030232193-A1 | Dry film resist and printed circuit board producing method | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-18 | — | — | US | disclosed |
| US-20030129504-A1 | Photosensitive resin compositon, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof | FUJI PHOTO FILM CO., LTD. | 2003-07-10 | — | — | US | disclosed |
| US-20020126377-A1 | Optical diffusion film and process of producing optical diffusion film | FUJIFILM CORPORATION (JP) | 2002-09-12 | — | — | US | disclosed |
| EP-1213600-A2 | Optical diffusion film and process of producing optical diffusion film | Fuji Photo Film Co., Ltd. (JP) | 2002-06-12 | — | — | EP | disclosed |
| EP-0563925-B1 | Photopolymerizable composition | FUJI PHOTO FILM CO LTD (JP) | 2000-02-02 | — | — | EP | disclosed |