SCHEMBL12674341

SCHEMBL12674341

CCC1CC2CC(COC(=O)C(F)(F)S(=O)(=O)N(CC(C)(C(=O)OC(C)(C)C)C(=O)OC(C)(C)C)S(=O)(=O)C(F)(F)F)CC(C1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15958788 0.80 ALDH1A1 (0.35) —
SCHEMBL12674173 0.76 CA12 (0.35) —
SCHEMBL12674337 0.72 HSD17B10 (0.36) —
SCHEMBL12667099 0.71 ALDH1A1 (0.35) —
SCHEMBL12667093 0.70 CA12 (0.33) —
SCHEMBL12674253 0.70 CA12 (0.33) —
SCHEMBL12674342 0.68 CA12 (0.30) —
SCHEMBL22958170 0.67 — —
SCHEMBL12667088 0.65 CA12 (0.31) —
SCHEMBL12667104 0.64 HSD17B10 (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110102528-A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2011-05-05 — — US disclosed
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