⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL786444 | 0.81 | LMNA (0.35) | — | |
| SCHEMBL687052 | 0.78 | LMNA (0.45) | — | |
| SCHEMBL18789504 | 0.78 | MEN1 (0.32) | — | |
| SCHEMBL786654 | 0.76 | LMNA (0.32) | — | |
| SCHEMBL22958150 | 0.76 | — | — | |
| SCHEMBL13425201 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL24409065 | 0.75 | — | — | |
| SCHEMBL20340810 | 0.75 | ALDH1A1 (0.33) | — | |
| SCHEMBL686562 | 0.75 | — | — | |
| SCHEMBL10099517 | 0.75 | CYP19A1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161256-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-10915022-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-09 | — | — | US | disclosed |