SCHEMBL12677367

SCHEMBL12677367

CCOCOc1ccc(C(c2ccc(OCC3CO3)cc2)C(c2ccc(OCC3CO3)cc2)c2ccc(OCC3CO3)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.51
TP53 P04637 3/20 0.51
TSHR P16473 3/20 0.51
MAPT P10636 2/20 0.51
HPGD P15428 2/20 0.51
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
HIF1A Q16665 2/20 0.51
CYP1A2 P05177 1/20 0.51
PPARG P37231 1/20 0.51
TDP1 Q9NUW8 1/20 0.50
PKM P14618 2/20 0.48
LMNA P02545 1/20 0.48
GAA P10253 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.45
CYP3A4 P08684 1/20 0.45
GLA P06280 1/20 0.40
GRM2 Q14416 1/20 0.36
FFAR1 O14842 3/20 0.35
HRH3 Q9Y5N1 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21953799 1.00 ALDH1A1 (0.51) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL12677165 0.91 ALDH1A1 (0.51) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL16314556 0.89 ALDH1A1 (0.49) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL16488801 0.87 TDP1 (0.63) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL22294896 0.87 TDP1 (0.63) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL31450 0.87 TDP1 (0.63) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL25020811 0.86 ALDH1A1 (0.55) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL20727163 0.86 ALDH1A1 (0.55) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL18535693 0.86 ALDH1A1 (0.55) ALDH1A1TP53TSHRMAPTHPGD
SCHEMBL22294894 0.85 ALDH1A1 (0.46) ALDH1A1TP53TSHRMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024150571-A1 PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 富士フイルム株式会社 2024-07-18 WO disclosed
WO-2024150574-A1 PATTERN FORMATION METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2024-07-18 WO disclosed
US-20230176479-A1 NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-08 US disclosed
US-20170256331-A1 COMPOSITION, LAMINATE, METHOD OF MANUFACTURING LAMINATE, TRANSISTOR, AND METHOD OF MANUFACTURING TRANSISTOR NIKON CORPORATION (JP) 2017-09-07 US disclosed
EP-3135733-A1 DISPERSION COMPOSITION, AND CURABLE COMPOSITION, TRANSPARENT FILM, MICROLENS AND SOLID-STATE IMAGING ELEMENT USING SAME FUJIFILM Corporation (JP) 2017-03-01 EP disclosed