Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.42 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.42 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA4 | P22748 | 1/20 | 0.42 |
| ▸ | CA6 | P23280 | 1/20 | 0.42 |
| ▸ | SNCA | P37840 | 3/20 | 0.41 |
| ▸ | IGFBP5 | P24593 | 1/20 | 0.39 |
| ▸ | DBH | P09172 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30375459 | 1.00 | MAPT (0.48) | MAPTCYP3A4CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL250884 | 0.82 | HSD17B10 (0.66) | MAPTCYP3A4CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL30058625 | 0.82 | CA1 (0.61) | MAPTCYP3A4CYP2D6HSD17B10CYP17A1 | |
| SCHEMBL545298 | 0.82 | CA1 (0.61) | MAPTCYP3A4CYP2D6HSD17B10CYP17A1 | |
| SCHEMBL5071987 | 0.80 | CYP17A1 (0.59) | MAPTCYP3A4CYP2D6HSD17B10CYP17A1 | |
| SCHEMBL27909894 | 0.79 | CYP17A1 (0.54) | MAPTCYP3A4CYP17A1CYP19A1CYP11B1 | |
| SCHEMBL30375239 | 0.78 | ESR1 (0.53) | MAPTCYP3A4CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL22500136 | 0.78 | ESR1 (0.53) | MAPTCYP3A4CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL3186981 | 0.75 | HIF1A (0.55) | MAPTCYP3A4CYP2C9CYP2C19HSD17B10 | |
| SCHEMBL30374873 | 0.75 | HIF1A (0.55) | MAPTCYP3A4CYP2C9CYP2C19HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| CN-113785023-B | Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same | 株式会社百乐 | 2023-05-12 | — | — | CN | disclosed |
| CN-113785023-A | Water-based ink composition for reversible thermal discoloration writing instrument, refill containing the same, and water-based ballpoint pen | 株式会社百乐 | 2021-12-10 | — | — | CN | disclosed |
| CN-113646052-A | Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment | 百乐墨水株式会社 | 2021-11-12 | — | — | CN | disclosed |
| WO-2020209118-A1 | REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME | 株式会社パイロットコーポレーション | 2020-10-15 | — | — | WO | disclosed |
| WO-2020203603-A1 | REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME | パイロットインキ株式会社 | 2020-10-08 | — | — | WO | disclosed |
| EP-1788433-B1 | Silicon-containing film forming composition and substrate processing method | SHINETSU CHEMICAL CO (JP) | 2014-07-09 | — | — | EP | disclosed |
| US-8349533-B2 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8313890-B2 | Antireflective coating composition, antireflective coating, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-7910283-B2 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-03-22 | — | — | US | disclosed |
| EP-1236745-A2 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-04 | — | — | EP | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20020042017-A1 | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| US-20020012871-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |