Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNA7 | P36544 | 5/20 | 0.51 |
| ▸ | CHRNB4 | P30926 | 4/20 | 0.51 |
| ▸ | CHRNA3 | P32297 | 4/20 | 0.51 |
| ▸ | CHRNB2 | P17787 | 3/20 | 0.51 |
| ▸ | CHRNA4 | P43681 | 3/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.38 |
| ▸ | AHR | P35869 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15505269 | 0.92 | CHRNA7 (0.53) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL9314774 | 0.88 | CHRNA7 (0.51) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL9183219 | 0.86 | CHRNA7 (0.53) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL9460875 | 0.86 | CHRNA7 (0.40) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL4372162 | 0.84 | CHRNA7 (0.50) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL9315267 | 0.83 | TLR4 (0.41) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL15505290 | 0.83 | CHRNA7 (0.47) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL14369373 | 0.82 | CHRNA7 (0.54) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL15505292 | 0.81 | CHRNA7 (0.54) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 | |
| SCHEMBL8759516 | 0.81 | CHRNB2 (0.33) | CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0367219-B1 | Polyorganosiloxane series thermoplastic resin and composition thereof | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-08-31 | — | — | EP | claimed |
| US-5147947-A | Graft polymer containing vinyl monomer; friction resistance | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-09-15 | — | — | US | claimed |
| EP-0367219-A2 | Polyorganosiloxane series thermoplastic resin and composition thereof | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-09 | — | — | EP | claimed |
| US-20250019536-A1 | STRESS REDUCING AGENT AND RESIN COMPOSITION | KANEKA CORPORATION (JP) | 2025-01-16 | — | — | US | disclosed |
| EP-4446352-A1 | WATER-BASED COATING | Kaneka Corporation (JP) | 2024-10-16 | — | — | EP | disclosed |
| US-20240327671-A1 | WATER-BASED COATING | KANEKA CORPORATION (JP) | 2024-10-03 | — | — | US | disclosed |
| CN-118369388-A | Water paint | 株式会社钟化 | 2024-07-19 | — | — | CN | disclosed |
| WO-2023190135-A1 | STRESS REDUCING AGENT AND RESIN COMPOSITION | 株式会社カネカ | 2023-10-05 | — | — | WO | disclosed |
| WO-2023106317-A1 | WATER-BASED COATING | 株式会社カネカ | 2023-06-15 | — | — | WO | disclosed |
| US-11046800-B2 | Resin component disposed in route of beam emitted by radar device, radome, and radar device | TECHNO-UMG CO., LTD. (JP) | 2021-06-29 | — | — | US | disclosed |
| CN-108603005-B | Resin member disposed on path of beam emitted from radar device, radome, and radar device | 大科能宇菱通株式会社 | 2020-11-03 | — | — | CN | disclosed |
| EP-0710679-A2 | Process for producing polyorganosiloxane-based thermoplastic resin | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-05-08 | — | — | EP | disclosed |
| US-5457167-A | Impact strength, chemical resistance | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-10-10 | — | — | US | disclosed |
| EP-0653447-A1 | Polyorganosiloxane-type thermoplastic resin | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-17 | — | — | EP | disclosed |
| EP-0367219-B1 | Polyorganosiloxane series thermoplastic resin and composition thereof | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-08-31 | — | — | EP | disclosed |
| US-5342983-A | Polymer reforming agents | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-08-30 | — | — | US | disclosed |
| US-5210252-A | 3-(VINYLPHENYLOXY)PROPYLSILANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1993-05-11 | — | — | US | disclosed |
| EP-0529583-A1 | 3-(Vinylphenyloxy) propylsilane compound | Shin-Etsu Chemical Co., Ltd. (JP) | 1993-03-03 | — | — | EP | disclosed |
| US-5147947-A | Graft polymer containing vinyl monomer; friction resistance | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-09-15 | — | — | US | disclosed |
| EP-0367219-A2 | Polyorganosiloxane series thermoplastic resin and composition thereof | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-09 | — | — | EP | disclosed |