⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1270373 | 0.78 | THRA (0.34) | — | |
| SCHEMBL10025731 | 0.78 | MEN1 (0.42) | — | |
| SCHEMBL4804229 | 0.76 | — | — | |
| SCHEMBL10025728 | 0.73 | — | — | |
| SCHEMBL23462627 | 0.71 | — | — | |
| SCHEMBL17087729 | 0.71 | — | — | |
| SCHEMBL1270392 | 0.69 | — | — | |
| SCHEMBL10025730 | 0.68 | — | — | |
| SCHEMBL22336257 | 0.67 | ALDH1A1 (0.40) | — | |
| SCHEMBL23563148 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| EP-1664927-B1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | COMMW SCIENT IND RES ORG (AU) | 2011-04-06 | — | — | EP | claimed |
| EP-2287671-A1 | Process for forming a coated substrate | Commonwealth Scientific and Industrial Research Organisation (AU) | 2011-02-23 | — | — | EP | claimed |
| US-7696292-B2 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2010-04-13 | — | — | US | claimed |
| US-20090253074-A1 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-10-08 | — | — | US | claimed |
| WO-2008021291-A2 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-02-21 | — | — | WO | claimed |
| EP-1664927-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-06-07 | — | — | EP | claimed |
| US-20050119378-A1 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | DUPONT ELECTRONICS, INC. | 2005-06-02 | — | — | US | claimed |
| WO-2005031461-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-07 | — | — | WO | claimed |
| EP-2970538-B1 | POLYMERIZATION PROCESS PROTECTION MEANS | DUPONT ELECTRONICS INC (US) | 2021-10-20 | — | — | EP | disclosed |
| EP-2970538-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. du Pont de Nemours and Company (US) | 2016-01-20 | — | — | EP | disclosed |
| WO-2014150700-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2014-09-25 | — | — | WO | disclosed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | disclosed |
| US-8034534-B2 | Fluorinated polymers for use in immersion lithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-10-11 | — | — | US | disclosed |
| EP-1751194-A1 | METHOD FOR REMOVING SULFUR-CONTAINING END GROUPS | E.I.Du pont de nemours and company (US) | 2007-02-14 | — | — | EP | disclosed |
| CN-1853139-A | Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography | DU PONT (US) | 2006-10-25 | — | — | CN | disclosed |
| EP-1664927-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-06-07 | — | — | EP | disclosed |
| WO-2005113612-A1 | METHOD FOR REMOVING SULFUR-CONTAINING END GROUPS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-12-01 | — | — | WO | disclosed |
| US-20050119378-A1 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | DUPONT ELECTRONICS, INC. | 2005-06-02 | — | — | US | disclosed |
| WO-2005031461-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-07 | — | — | WO | disclosed |