SCHEMBL1271010

SCHEMBL1271010

C[Si](C)(Cl)C[Si](C)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL330600 0.82
SCHEMBL331729 0.82
SCHEMBL19829859 0.75 ALDH1A1 (0.39)
SCHEMBL996306 0.75
SCHEMBL996456 0.75
SCHEMBL1270984 0.75
SCHEMBL2463466 0.75 ALDH1A1 (0.39)
SCHEMBL7556421 0.75
SCHEMBL9392907 0.75 ALDH1A1 (0.39)
SCHEMBL21828899 0.67 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112566950-B Organopolysiloxane compound, method for producing same, and antistatic agent and curable composition containing same 信越化学工业株式会社 2022-11-08 CN disclosed
US-11352377-B2 Process for the production of organohydridochlorosilanes MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-06-07 US disclosed
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM JSR CORPORATION (JP) 2011-02-24 US disclosed
EP-2264219-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF JSR Corporation (JP) 2010-12-22 EP disclosed