⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7556421 | 0.82 | — | — | |
| SCHEMBL996306 | 0.82 | — | — | |
| SCHEMBL1271010 | 0.82 | — | — | |
| SCHEMBL9392907 | 0.82 | ALDH1A1 (0.39) | — | |
| SCHEMBL996044 | 0.82 | ALDH1A1 (0.31) | — | |
| SCHEMBL4732962 | 0.71 | — | — | |
| SCHEMBL79453 | 0.70 | — | — | |
| SCHEMBL124324 | 0.70 | — | — | |
| SCHEMBL149083 | 0.70 | ALDH1A1 (0.46) | — | |
| SCHEMBL331729 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270096-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MAT US LLC (US) | 2025-08-28 | — | — | US | claimed |
| US-12297115-B2 | High temperature atomic layer deposition of silicon-containing film | VERSUM MATERIALS US, LLC (US) | 2025-05-13 | — | — | US | claimed |
| US-20210380418-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MATERIALS US, LLC (US) | 2021-12-09 | — | — | US | claimed |
| CN-112969817-A | High temperature atomic layer deposition of silicon-containing films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| WO-2020072874-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2020-04-09 | — | — | WO | claimed |
| US-20070181873-A1 | Organic-inorganic hybrid polymer and organic insulator composition having the same and methods thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-09 | — | — | US | claimed |
| EP-4673508-A1 | TWO-PART ADDITION CURE THERMAL CONTROL COATING | Momentive Performance Materials Inc. (US) | 2026-01-07 | — | — | EP | disclosed |
| WO-2025229081-A1 | ORGANOAMINO-CARBOSILANES AND METHODS FOR DEPOSITING SILICONCONTAINING FILMS USING SAME | MERCK PATENT GMBH (DE) | 2025-11-06 | — | — | WO | disclosed |
| US-20250270096-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MAT US LLC (US) | 2025-08-28 | — | — | US | disclosed |
| US-12297115-B2 | High temperature atomic layer deposition of silicon-containing film | VERSUM MATERIALS US, LLC (US) | 2025-05-13 | — | — | US | disclosed |
| CN-119951563-A | M@ZSM-5 based composite catalyst and preparation method and application thereof | 中国科学院过程工程研究所 | 2025-05-09 | — | — | CN | disclosed |
| CN-119951412-A | Continuous catalytic cracking device and method for organic silicon high-boiling-point substances | 中国科学院过程工程研究所 | 2025-05-09 | — | — | CN | disclosed |
| CN-119951567-A | Co@HZ/B catalyst and preparation method and application thereof | 中国科学院过程工程研究所 | 2025-05-09 | — | — | CN | disclosed |
| US-20070181873-A1 | Organic-inorganic hybrid polymer and organic insulator composition having the same and methods thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-09 | — | — | US | disclosed |
| US-20070111967-A1 | Organosilicon compounds and their use | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070111967-A1 | Organosilicon compounds and their use | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1648906-A1 | ORGANOSILICON COMPOUNDS AND THEIR USE | Paradigm Therapeutics Limited (GB) | 2006-04-26 | — | — | EP | disclosed |
| WO-2005005443-A1 | ORGANOSILICON COMPOUNDS AND THEIR USE | PARADIGM THERAPEUTICS LTD. (GB) | 2005-01-20 | — | — | WO | disclosed |
| US-4435587-A | REACTION OF A SILICON HALIDE COMPOUND WITH AN ISOCYANATE OR CYANATE | MATSUMOTO SEIYAKU KOGYO KABUSHIKI KAISHA (JP) | 1984-03-06 | — | — | US | disclosed |