SCHEMBL1275239

SCHEMBL1275239

CC(C)(C)c1ccc(CC[Si](Cl)(Cl)Cl)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.47
ESRRG P62508 6/20 0.44
ESRRB O95718 2/20 0.42
SIGMAR1 Q99720 2/20 0.42
CNR1 P21554 1/20 0.42
GRIA4 P48058 1/20 0.41
EPHX2 P34913 1/20 0.41
NR1H4 Q96RI1 1/20 0.41
SLC13A5 Q86YT5 2/20 0.40
MEN1 O00255 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40
KMT2A Q03164 1/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
DAO P14920 1/20 0.40
GPR84 Q9NQS5 1/20 0.40
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11120539 0.88 KCNH2 (0.47) KCNH2ESRRGESRRBSIGMAR1CNR1
SCHEMBL2869439 0.86 KCNH2 (0.46) KCNH2ESRRGESRRBSIGMAR1CNR1
SCHEMBL6848455 0.82 CA2 (0.38) CYP1A2CYP2C19
SCHEMBL20473031 0.80 TSHR (0.44) KCNH2SIGMAR1MEN1CYP1A2CYP2C19
SCHEMBL7456580 0.79 KCNH2 (0.59) KCNH2ESRRGESRRBSIGMAR1GRIA4
SCHEMBL5483410 0.79 TAAR1 (0.55) KCNH2CNR1DAO
SCHEMBL11116563 0.78 KCNH2 (0.40) KCNH2ESRRGESRRBSIGMAR1CNR1
SCHEMBL28660351 0.78 KCNH2 (0.46) KCNH2ESRRGESRRBSIGMAR1GRIA4
SCHEMBL30064836 0.76 ESRRG (0.45) KCNH2ESRRGESRRBSIGMAR1CNR1
SCHEMBL697688 0.76 CA2 (0.52) KCNH2ESRRGESRRBSIGMAR1GRIA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2567940-B1 METHOD FOR PREPARING CLAYS HAVING NOVEL PHYSICO-CHEMICAL PROPERTIES ECOLE DE BIOLOGIE IND (EBI) (FR) 2017-06-21 EP claimed
US-20130153263-A1 INORGANIC NANOFILLER, PARTIAL DISCHARGE RESISTANT ENAMELED WIRE INCLUDING THE SAME, AND PREPARING METHOD OF THE ENAMELED WIRE SEJONG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2013-06-20 US claimed
WO-2025137670-A1 NON-FLUORINATED POLYMER ADDITIVES AND RELATED METHODS HENKEL AG & CO. KGAA (DE) 2025-06-26 WO disclosed
US-12109812-B2 Ink jet printing method and ink jet printing apparatus SEIKO EPSON CORPORATION (JP) 2024-10-08 US disclosed
EP-3743464-B1 ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF BRONX CREATIVE&DESIGN CENTRE PTE LTD (SG) 2024-03-06 EP disclosed
US-20230250250-A1 Organic-inorganic Aerogel Composites, Methods and Uses Thereof BRONX CREATIVE & DESIGN CENTRE PTE LTD (SG) 2023-08-10 US disclosed
CN-114055975-B Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2023-05-12 CN disclosed
US-20220355262-A1 SYSTEM AND METHOD FOR MANUFACTURING WATER-BASED HYDROPHOBIC AEROGELS AND AEROGEL COMPOSITES KROSSLINKER PTE LTD (SG) 2022-11-10 US disclosed
CN-114144388-A Systems and methods for manufacturing water-based hydrophobic aerogels and aerogel composites 克罗斯林克私人有限公司 2022-03-04 CN disclosed
CN-114055975-A Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2022-02-18 CN disclosed
US-20220032618-A1 Ink Jet Printing Method And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2022-02-03 US disclosed
US-20060019034-A1 Process for producing chemical adsorption film and chemical adsorption film SEIKO EPSON CORPORATION (JP) 2006-01-26 US disclosed
US-20050287392-A1 Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2005-12-29 US disclosed
EP-1492581-A1 POLYMER COATING FOR MEDICAL DEVICES CV THERAPEUTICS, INC. (US) 2005-01-05 EP disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed
US-20030219562-A1 Polymer coating for medical devices CV THERAPEUTICS, INC. 2003-11-27 US disclosed
WO-2003068289-A1 POLYMER COATING FOR MEDICAL DEVICES CV THERAPEUTICS, INC. (US) 2003-08-21 WO disclosed
EP-1020403-A1 Haloalkyl silane containing zeolite powder Degussa-Hüls Aktiengesellschaft (DE) 2000-07-19 EP disclosed