Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BRS3 | P32247 | 1/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | KDM1A | O60341 | 1/20 | 0.31 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.31 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.31 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12753363 | 0.85 | BRS3 (0.38) | BRS3SLC6A3EPHX2CNR2KDM1A | |
| SCHEMBL15840370 | 0.79 | SLC6A3 (0.34) | SLC6A3EPHX2 | |
| SCHEMBL12829034 | 0.79 | EPHX2 (0.34) | SLC6A3EPHX2 | |
| SCHEMBL12928218 | 0.75 | — | — | |
| SCHEMBL10234120 | 0.74 | LIPA (0.35) | ELANE | |
| SCHEMBL6861923 | 0.74 | SLC6A3 (0.34) | SLC6A3 | |
| SCHEMBL12009279 | 0.73 | BRS3 (0.34) | BRS3EPHX2CNR2TAS1R3TAS1R1 | |
| SCHEMBL13382475 | 0.72 | GPR119 (0.32) | — | |
| SCHEMBL13382473 | 0.72 | BTK (0.36) | — | |
| SCHEMBL16168124 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |