SCHEMBL12761692

SCHEMBL12761692

CCN1CN(C)N=N1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL34315 0.50 — —
SCHEMBL407168 0.50 SMN1; SMN2 (0.31) —
SCHEMBL4155416 0.50 — —
SCHEMBL24454854 0.50 — —
SCHEMBL1102338 0.50 SMN1; SMN2 (0.31) —
SCHEMBL5493927 0.49 MAPT (0.30) —
SCHEMBL12712328 0.49 MAPT (0.30) —
SCHEMBL27631046 0.48 — —
SCHEMBL4450796 0.48 TSHR (0.30) —
SCHEMBL24052332 0.47 CHRNA7 (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9035055-B2 Photoelectric conversion material, film containing the material, photoelectric conversion device, production method thereof, photosensor, imaging device and their use methods FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-9035055-B2 Photoelectric conversion material, film containing the material, photoelectric conversion device, production method thereof, photosensor, imaging device and their use methods FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-20110056562-A1 PHOTOELECTRIC CONVERSION MATERIAL, FILM CONTAINING THE MATERIAL, PHOTOELECTRIC CONVERSION DEVICE, PRODUCTION METHOD THEREOF, PHOTOSENSOR, IMAGING DEVICE AND THEIR USE METHODS FUJIFILM CORPORATION (JP) 2011-03-10 — — US disclosed
US-20110056562-A1 PHOTOELECTRIC CONVERSION MATERIAL, FILM CONTAINING THE MATERIAL, PHOTOELECTRIC CONVERSION DEVICE, PRODUCTION METHOD THEREOF, PHOTOSENSOR, IMAGING DEVICE AND THEIR USE METHODS FUJIFILM CORPORATION (JP) 2011-03-10 — — US disclosed
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