⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12762001 | 0.94 | — | — | |
| SCHEMBL12762007 | 0.92 | — | — | |
| SCHEMBL12761999 | 0.92 | — | — | |
| SCHEMBL12762005 | 0.88 | ALDH1A1 (0.30) | — | |
| SCHEMBL13402992 | 0.84 | — | — | |
| SCHEMBL12762032 | 0.81 | — | — | |
| SCHEMBL12762011 | 0.79 | — | — | |
| SCHEMBL12762013 | 0.79 | — | — | |
| SCHEMBL14199628 | 0.77 | — | — | |
| SCHEMBL14199636 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7794916-B2 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-09-14 | — | — | US | disclosed |
| US-20080187863-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-7351515-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-04-01 | — | — | US | disclosed |
| US-7267934-B2 | Method of forming an image | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-09-11 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20070054225-A1 | SILVER SALT PHOTOTHERMOGRAPHIC DRY IMAGING MATERIAL | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2007-03-08 | — | — | US | disclosed |