⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14219875 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL17166864 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL10061834 | 0.76 | PAX8 (0.34) | — | |
| SCHEMBL12705169 | 0.75 | — | — | |
| SCHEMBL686178 | 0.75 | — | — | |
| SCHEMBL16269850 | 0.74 | CYP1A2 (0.32) | — | |
| SCHEMBL686102 | 0.74 | — | — | |
| SCHEMBL12998291 | 0.73 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL12057578 | 0.73 | CYP3A4 (0.36) | — | |
| SCHEMBL14535465 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| EP-1780224-B1 | MULTIBRANCHED POLYMERS AND PROCESS FOR PRODUCTION THEREOF | NIPPON SODA CO (JP) | 2015-02-18 | — | — | EP | disclosed |
| US-8513457-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-20 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-1752479-B1 | ACRYLIC STAR POLYMER | NIPPON SODA CO (JP) | 2013-02-27 | — | — | EP | disclosed |
| US-7919570-B2 | narrowly dispersed; controlled molecular weight; ionic conductivity, shape stability; battery adhesive or binder; 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane or pentaerythritol reacted with bromoisobutyroyl bromide for core; living radical polymerization of acrylate or a styrene at halogen atoms as the arms | NIPPON SODA CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| EP-2296040-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-20080214685-A1 | Multibrached Polymer and Method for Producing the Same | NIPPON SODA CO., LTD. (JP) | 2008-09-04 | — | — | US | disclosed |
| EP-1780224-A1 | MULTIBRANCHED POLYMERS AND PROCESS FOR PRODUCTION THEREOF | NIPPON SODA CO., LTD. (JP) | 2007-05-02 | — | — | EP | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |