SCHEMBL12873002

SCHEMBL12873002

CC(C)CC(NC(=O)OC(C)(C)C)C(=O)OCc1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CTSK P43235 8/20 0.64
POLB P06746 1/20 0.59
GPR55 Q9Y2T6 1/20 0.59
MEN1 O00255 1/20 0.58
RECQL P46063 1/20 0.58
KMT2A Q03164 1/20 0.58
MAPT P10636 2/20 0.57
NPSR1 Q6W5P4 2/20 0.57
TDP1 Q9NUW8 2/20 0.57
XBP1 P17861 1/20 0.57
CTSS P25774 3/20 0.57
CTSL P07711 2/20 0.57
CTSB P07858 1/20 0.57
PPARA Q07869 1/20 0.57
KDM4E B2RXH2 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13519505 1.00 CTSK (0.64) CTSKPOLBGPR55MEN1RECQL
SCHEMBL12214454 1.00 CTSK (0.64) CTSKPOLBGPR55MEN1RECQL
SCHEMBL16984912 0.95 CTSK (0.65) CTSKCTSSCTSLCTSB
SCHEMBL4576421 0.95 CTSK (0.65) CTSKCTSSCTSLCTSB
SCHEMBL25977611 0.95 CTSK (0.65) CTSKCTSSCTSLCTSB
SCHEMBL9551300 0.92 REN (0.66) CTSKCTSSCTSLCTSB
SCHEMBL15255353 0.92 REN (0.66) CTSKCTSSCTSLCTSB
SCHEMBL11761725 0.92 CTSK (0.62) CTSKPOLBGPR55MEN1RECQL
SCHEMBL11761731 0.92 CTSK (0.62) CTSKPOLBGPR55MEN1RECQL
SCHEMBL9551248 0.91 REN (0.68) CTSKCTSSCTSLCTSB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-8475999-B2 Compound and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-8475999-B2 Compound and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME RCOR3, RCN1, HRH4 CTSK 2456/4885POLB 4125/4885GPR55 1922/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.