⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13930376 | 0.90 | — | — | |
| SCHEMBL13924702 | 0.86 | — | — | |
| SCHEMBL12907421 | 0.85 | — | — | |
| SCHEMBL12907366 | 0.82 | EPHX2 (0.35) | — | |
| SCHEMBL13939934 | 0.77 | MEN1 (0.33) | — | |
| SCHEMBL13924703 | 0.77 | EPHX2 (0.32) | — | |
| SCHEMBL12907434 | 0.76 | — | — | |
| SCHEMBL11911870 | 0.75 | CA12 (0.40) | — | |
| SCHEMBL11950508 | 0.75 | CA12 (0.40) | — | |
| SCHEMBL10228469 | 0.75 | NAAA (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |