SCHEMBL12910285

SCHEMBL12910285

O=c1c2cc3c(=O)n(-c4ccccc4O)c(=O)c3cc2c(=O)n1-c1ccccc1O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 1.00
KDM4E B2RXH2 3/20 1.00
GAA P10253 2/20 1.00
BRD4 O60885 1/20 0.50
METAP2 P50579 1/20 0.49
MAPT P10636 3/20 0.48
XBP1 P17861 1/20 0.48
MAPK1 P28482 1/20 0.48
KMT2A Q03164 6/20 0.47
ALDH1A1 P00352 2/20 0.47
MEN1 O00255 4/20 0.45
TDP1 Q9NUW8 1/20 0.43
CYP1A2 P05177 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
HDAC4 P56524 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
PKM P14618 1/20 0.40
RECQL P46063 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8544900 0.79 POLB (0.65) POLBKDM4EGAABRD4METAP2
SCHEMBL5021829 0.77 KDM4E (0.62) POLBKDM4EGAAMAPTKMT2A
SCHEMBL22203819 0.75 TDP1 (0.68) POLBKDM4EGAAMAPTMAPK1
SCHEMBL19402618 0.72 ALDH1A1 (0.57) POLBKDM4EGAAMAPTMAPK1
SCHEMBL9588529 0.72 KDM4E (0.54) POLBKDM4EGAAMAPTXBP1
SCHEMBL30721717 0.71 POLB (0.55) POLBKDM4EGAABRD4METAP2
SCHEMBL15455189 0.71 POLB (0.55) POLBKDM4EGAABRD4METAP2
SCHEMBL10790345 0.71 BRD4 (0.56) POLBKDM4EGAABRD4METAP2
SCHEMBL13310390 0.70 MAPK1 (0.74) POLBKDM4EGAAMETAP2MAPT
SCHEMBL9119078 0.70 HSP90AA1 (0.72) POLBKDM4EGAABRD4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236508-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2023-07-27 US disclosed
US-20230236508-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2023-07-27 US disclosed
WO-2021261424-A1 RESIN, METHOD FOR PRODUCING SAME, THERMOSETTING RESIN COMPOSITION, AND CURED PRODUCT 群栄化学工業株式会社 2021-12-30 WO disclosed
US-7868064-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2011-01-11 US disclosed
US-7868064-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2011-01-11 US disclosed
US-7851518-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2010-12-14 US disclosed
US-7851518-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2010-12-14 US disclosed
US-20100045761-A1 INK RECEPTIVE PARTICLES, MATERIAL FOR RECORDING, RECORDING APPARATUS AND INK RECEPTIVE PARTICLE STORAGE CARTRIDGE FUJI XEROX CO., LTD. (JP) 2010-02-25 US disclosed
US-20100045761-A1 INK RECEPTIVE PARTICLES, MATERIAL FOR RECORDING, RECORDING APPARATUS AND INK RECEPTIVE PARTICLE STORAGE CARTRIDGE FUJI XEROX CO., LTD. (JP) 2010-02-25 US disclosed
US-20100041812-A1 INK RECEPTIVE PARTICLES, MATERIAL FOR RECORDING, RECORDING APPARATUS AND INK RECEPTIVE PARTICLE STORAGE CARTRIDGE FUJI XEROX CO., LTD. (JP) 2010-02-18 US disclosed
US-20100041812-A1 INK RECEPTIVE PARTICLES, MATERIAL FOR RECORDING, RECORDING APPARATUS AND INK RECEPTIVE PARTICLE STORAGE CARTRIDGE FUJI XEROX CO., LTD. (JP) 2010-02-18 US disclosed
US-7638562-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2009-12-29 US disclosed
US-7638562-B2 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. (JP) 2009-12-29 US disclosed
US-20080032074-A1 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. 2008-02-07 US disclosed
US-20080032074-A1 Ink receptive particles, material for recording, recording apparatus and ink receptive particle storage cartridge FUJI XEROX CO., LTD. 2008-02-07 US disclosed