⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5277499 | 0.79 | — | — | |
| SCHEMBL8384731 | 0.79 | — | — | |
| SCHEMBL16190098 | 0.79 | — | — | |
| SCHEMBL2778115 | 0.74 | TSHR (0.30) | — | |
| SCHEMBL12549579 | 0.74 | — | — | |
| SCHEMBL4968266 | 0.74 | TSHR (0.30) | — | |
| SCHEMBL1873757 | 0.74 | — | — | |
| SCHEMBL1298425 | 0.73 | — | — | |
| SCHEMBL10033522 | 0.72 | TSHR (0.36) | — | |
| SCHEMBL19821932 | 0.72 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2407576-A1 | PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN PROCESS FOR PRODUCING METALLIC THIN FILM, AND PURGE SOLVENT | Adeka Corporation (JP) | 2012-01-18 | — | — | EP | disclosed |
| US-20110268887-A1 | PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN METALLIC-THIN-FILM PRODUCTION METHOD AND PURGE SOLVENT | ADEKA CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20070287086-A1 | Colored photosensitive resin composition, color filter, image sensor, and camera system | SONY CORPORATION (JP) | 2007-12-13 | — | — | US | disclosed |
| EP-1860502-A1 | Colored photosensitive resin composition, color filter, image sensor, and camera system | Sumitomo Chemical Company, Limited (JP) | 2007-11-28 | — | — | EP | disclosed |
| CN-101078877-A | Colored photosensitive resin composition, color filter, image sensor, and camera system | SUMITOMO CHEMICAL CO (JP) | 2007-11-28 | — | — | CN | disclosed |
| EP-0628026-B1 | CYANO-OXIME ETHERS, PROCESS FOR PRODUCING THEM, AGENTS CONTAINING THEM AND THEIR USE | BASF AG (DE) | 1997-01-22 | — | — | EP | disclosed |
| EP-0628026-A1 | CYANO-OXIME ETHERS, PROCESS FOR PRODUCING THEM, AGENTS CONTAINING THEM AND THEIR USE. | BASF AG (DE) | 1994-12-14 | — | — | EP | disclosed |
| WO-1993016985-A1 | CYANO-OXIME ETHERS, PROCESS FOR PRODUCING THEM, AGENTS CONTAINING THEM AND THEIR USE | BASF AKTIENGESELLSCHAFT (DE) | 1993-09-02 | — | — | WO | disclosed |