SCHEMBL13004852

SCHEMBL13004852

O=C(Oc1ccc2cc(OC(=O)C3CCCCC3)ccc2c1)C1CCCCC1

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 7/20 0.79
▸ MAPT P10636 3/20 0.79
▸ MEN1 O00255 2/20 0.79
▸ L3MBTL1 Q9Y468 2/20 0.78
▸ HTT P42858 4/20 0.69
▸ SMN1; SMN2 Q16637 2/20 0.69
▸ TDP1 Q9NUW8 1/20 0.69
▸ KDM4E B2RXH2 3/20 0.68
▸ ALDH1A1 P00352 2/20 0.68
▸ GLA P06280 1/20 0.68
▸ GAA P10253 1/20 0.68
▸ POLB P06746 2/20 0.66
▸ ELANE P08246 2/20 0.59
▸ ATM Q13315 1/20 0.59
▸ CA2 P00918 1/20 0.54
▸ PDGFRB P09619 2/20 0.53
▸ PDGFRA P16234 2/20 0.53
▸ FAAH O00519 1/20 0.53
▸ EPHX1 P07099 1/20 0.53
▸ USP2 O75604 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18058689 0.96 KMT2A (0.85) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL13004851 0.93 L3MBTL1 (0.91) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL8589037 0.92 KMT2A (0.69) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL14877839 0.91 KMT2A (0.68) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL10574401 0.88 KMT2A (0.88) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL11829358 0.87 L3MBTL1 (0.75) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL14937109 0.84 L3MBTL1 (0.87) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL2051416 0.84 L3MBTL1 (0.87) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL18087028 0.83 KMT2A (0.78) KMT2AMAPTMEN1L3MBTL1HTT
SCHEMBL14864503 0.83 KMT2A (0.61) KMT2AMAPTMEN1L3MBTL1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10578774-B2 Retardation-increasing agent, cellulose-based resin composition using same, and film ADEKA CORPORATION (JP) 2020-03-03 — — US disclosed
US-20170315268-A1 RETARDATION-INCREASING AGENT, CELLULOSE-BASED RESIN COMPOSITION USING SAME, AND FILM ADEKA CORPORATION (JP) 2017-11-02 — — US disclosed
US-20170315268-A1 RETARDATION-INCREASING AGENT, CELLULOSE-BASED RESIN COMPOSITION USING SAME, AND FILM ADEKA CORPORATION (JP) 2017-11-02 — — US disclosed
US-20160274273-A1 RETARDATION-INCREASING AGENT, CELLULOSE-BASED RESIN COMPOSITION USING SAME, AND FILM ADEKA CORPORATION (JP) 2016-09-22 — — US disclosed
US-20160274273-A1 RETARDATION-INCREASING AGENT, CELLULOSE-BASED RESIN COMPOSITION USING SAME, AND FILM ADEKA CORPORATION (JP) 2016-09-22 — — US disclosed
US-20100316950-A1 COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-12-16 — — US disclosed
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