SCHEMBL13010275

SCHEMBL13010275

COc1ccc(N=Nc2ccc(N=Nc3ccc4c(S(=O)(=O)O)cc(S(=O)(=O)O)c(N)c4c3O)c3cc(S(=O)(=O)O)ccc23)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.64
MEN1 O00255 5/20 0.62
THRB P10828 5/20 0.62
KMT2A Q03164 5/20 0.62
HSD17B10 Q99714 4/20 0.62
HPGD P15428 4/20 0.62
RECQL P46063 4/20 0.62
TDP1 Q9NUW8 4/20 0.62
KDM4E B2RXH2 3/20 0.62
CYP3A4 P08684 3/20 0.62
MAPK1 P28482 3/20 0.62
ALDH1A1 P00352 3/20 0.62
MAPT P10636 3/20 0.62
BLM P54132 3/20 0.62
TP53 P04637 2/20 0.62
ALOX15 P16050 2/20 0.62
BRCA1 P38398 2/20 0.62
APEX1 P27695 2/20 0.62
SLC10A1 Q14973 1/20 0.62
CYP2C9 P11712 3/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13010278 0.89 CYP1A2 (0.68) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL17460957 0.85 HSD17B10 (0.74) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL4075937 0.85 CYP1A2 (0.64) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL13021201 0.83 CYP1A2 (0.69) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL416360 0.83 CYP2C9 (0.53) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL14148445 0.80 CYP1A2 (0.84) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL13021202 0.80 CYP1A2 (0.63) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL4067742 0.79 CYP1A2 (0.64) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL2602447 0.79 CYP1A2 (0.53) CYP1A2MEN1THRBKMT2AHSD17B10
SCHEMBL15127524 0.79 ENPP2 (0.53) MEN1THRBKMT2AHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741190-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2014-06-03 US disclosed
US-8734918-B2 Liquid crystal coating solution, and polarizing film NITTO DENKO CORPORATION (JP) 2014-05-27 US disclosed
US-8734918-B2 Liquid crystal coating solution, and polarizing film NITTO DENKO CORPORATION (JP) 2014-05-27 US disclosed
US-20130277871-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPRATION (JP) 2013-10-24 US disclosed
US-8491823-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2013-07-23 US disclosed
US-8491823-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2013-07-23 US disclosed
US-20100314784-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPORATION (JP) 2010-12-16 US disclosed
US-20100039608-A1 LIQUID CRYSTAL COATING SOLUTION, AND POLARIZING FILM NITTO DENKO CORPORATION (JP) 2010-02-18 US disclosed