SCHEMBL416360

SCHEMBL416360

COc1ccc(N=Nc2ccc(N=Nc3ccc4cc(S(=O)(=O)O)c(N)cc4c3O)c3cc(S(=O)(=O)O)ccc23)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 2/20 0.53
HSD17B10 Q99714 2/20 0.53
CYP2C19 P33261 1/20 0.53
PHLPP2 Q6ZVD8 1/20 0.52
SENP3 Q9H4L4 5/20 0.50
SENP2 Q9HC62 5/20 0.50
SENP1 Q9P0U3 5/20 0.50
SUMO2 P61956 3/20 0.50
SUMO1 P63165 3/20 0.50
SENP7 Q9BQF6 3/20 0.50
ENPP2 Q13822 5/20 0.46
MEN1 O00255 2/20 0.44
THRB P10828 2/20 0.44
KMT2A Q03164 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
CYP1A2 P05177 2/20 0.42
SLC7A11 Q9UPY5 1/20 0.41
ALDH1A1 P00352 2/20 0.41
HIF1A Q16665 1/20 0.41
PTGS2 P35354 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15127524 0.92 ENPP2 (0.53) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL416366 0.89 CYP2C9 (0.55) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL11926249 0.88 CYP2C9 (0.56) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL13596746 0.87 ENPP2 (0.46) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL414245 0.85 CYP2C9 (0.55) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL4401276 0.84 ENPP2 (0.44) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL9331655 0.84 ENPP2 (0.49) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL9331643 0.84 ENPP2 (0.49) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL13010275 0.83 CYP1A2 (0.64) CYP2C9HSD17B10CYP2C19PHLPP2SENP3
SCHEMBL9332175 0.82 CD40 (0.57) CYP2C9HSD17B10CYP2C19PHLPP2SENP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741190-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2014-06-03 US disclosed
US-8734677-B2 Liquid-crystal coating fluid and polarizing film NITTO DENKO CORPORATION (JP) 2014-05-27 US disclosed
US-20130277871-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPRATION (JP) 2013-10-24 US disclosed
US-20120062829-A1 LIQUID-CRYSTAL COATING FLUID AND POLARIZING FILM NITTO DENKO CORPORATION (JP) 2012-03-15 US disclosed