SCHEMBL13010279

SCHEMBL13010279

Nc1c(S(=O)(=O)O)cc(S(=O)(=O)O)c2ccc(N=Nc3cccc4c(O)c(N=Nc5ccc([N+](=O)[O-])cc5)c(S(=O)(=O)O)cc34)c(O)c12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 5/20 0.61
▸ HPGD P15428 5/20 0.49
▸ CYP3A4 P08684 4/20 0.49
▸ HSD17B10 Q99714 4/20 0.49
▸ MEN1 O00255 4/20 0.49
▸ THRB P10828 4/20 0.49
▸ RECQL P46063 4/20 0.49
▸ KMT2A Q03164 4/20 0.49
▸ CYP2C9 P11712 4/20 0.49
▸ MAPK1 P28482 4/20 0.49
▸ ALOX15 P16050 3/20 0.49
▸ ALDH1A1 P00352 3/20 0.49
▸ MAPT P10636 3/20 0.49
▸ BLM P54132 3/20 0.49
▸ CYP2C19 P33261 3/20 0.49
▸ KDM4E B2RXH2 3/20 0.49
▸ CYP2D6 P10635 2/20 0.49
▸ TSHR P16473 2/20 0.49
▸ TP53 P04637 2/20 0.49
▸ BRCA1 P38398 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4075937 0.86 CYP1A2 (0.64) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL16488672 0.82 CYP1A2 (0.51) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL13021202 0.81 CYP1A2 (0.63) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL11926252 0.79 CYP1A2 (0.47) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL28747721 0.79 ENPP2 (0.52) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL15281272 0.79 SENP2 (0.55) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL16488674 0.79 CYP1A2 (0.47) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL16153630 0.79 CYP1A2 (0.47) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL29595328 0.79 CYP1A2 (0.59) CYP1A2HPGDCYP3A4HSD17B10MEN1
SCHEMBL16153637 0.78 CYP1A2 (0.46) CYP1A2HPGDCYP3A4HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741190-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2014-06-03 — — US disclosed
US-8741190-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2014-06-03 — — US disclosed
US-8734918-B2 Liquid crystal coating solution, and polarizing film NITTO DENKO CORPORATION (JP) 2014-05-27 — — US disclosed
US-8734918-B2 Liquid crystal coating solution, and polarizing film NITTO DENKO CORPORATION (JP) 2014-05-27 — — US disclosed
US-20130277871-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPRATION (JP) 2013-10-24 — — US disclosed
US-20130277871-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPRATION (JP) 2013-10-24 — — US disclosed
US-8491823-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2013-07-23 — — US disclosed
US-8491823-B2 Process for producing water-resistant polarizing film NITTO DENKO CORPORATION (JP) 2013-07-23 — — US disclosed
US-20100314784-A1 PROCESS FOR PRODUCING WATER-RESISTANT POLARIZING FILM NITTO DENKO CORPORATION (JP) 2010-12-16 — — US disclosed
US-20100039608-A1 LIQUID CRYSTAL COATING SOLUTION, AND POLARIZING FILM NITTO DENKO CORPORATION (JP) 2010-02-18 — — US disclosed
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