⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27657233 | 0.70 | — | — | |
| SCHEMBL251080 | 0.64 | — | — | |
| SCHEMBL5318734 | 0.64 | — | — | |
| SCHEMBL676019 | 0.64 | — | — | |
| SCHEMBL4540080 | 0.64 | — | — | |
| SCHEMBL1134237 | 0.61 | — | — | |
| SCHEMBL1895236 | 0.60 | — | — | |
| SCHEMBL5617032 | 0.53 | — | — | |
| N-Nitrosodimethylamine SCHEMBL686 | 0.50 | — | — | |
| N-Nitrosodimethylamine SCHEMBL4637228 | 0.50 | ALDH1A1 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112947001-A | Photosensitive resin composition, dry film resist and manufacturing method of PCB | 浙江福斯特新材料研究院有限公司 | 2021-06-11 | — | — | CN | claimed |
| CN-116981996-A | Transfer film, method for producing laminate, and method for producing circuit wiring | 富士胶片株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-116472494-A | Method for producing laminate, method for producing circuit wiring board, and transfer film | 富士胶片株式会社 | 2023-07-21 | — | — | CN | disclosed |
| EP-2037323-B1 | Photosensitive compositions | FUJIFILM CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| EP-2141206-B1 | Novel compound, polymerizable composition, color filter and production method thereof, solid-state imaging device, and planographic printing plate precursor | FUJIFILM CORP (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8846277-B2 | Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| EP-1273972-B1 | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate and method for preparing lithographic printing plate | FUJIFILM CORP (JP) | 2014-09-10 | — | — | EP | disclosed |
| US-8728686-B2 | Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors | FUJIFILM CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8703366-B2 | — | — | 2014-04-22 | — | — | US | disclosed |
| EP-2207062-B1 | Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors | FUJIFILM CORP (JP) | 2012-09-12 | — | — | EP | disclosed |
| US-6808864-B2 | ANODIZED AND GRAINED ALUMINUM INTERMETALLIC; RESISTANCE TO AGGRESSIVE INK STAINING AGAINST A WIDER RANGE OF IMAGE RECORDING LAYERS AND PLATE DEVELOPERS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20040165882-A1 | Method for replenishing developer of automatic developing apparatus for photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD | 2004-08-26 | — | — | US | disclosed |
| EP-1437626-A2 | Method for replenishing developer of automatic developing apparatus for photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2004-07-14 | — | — | EP | disclosed |
| US-6756183-B2 | IMAGEWISE EXPOSING PRESENSITIZED PLATE COMPRISING GRAINED AND ANODIZED SUBSTRATE WITH PHOTOPOLYMERIZABLE LIGHT-SENSITIVE LAYER CONTAINING ACRYLIC ACID-ITACONIC ACID COPOLYMER AND TITANOCENE PHOTOINITIATOR, THEN DEVELOPING | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| EP-1400852-A2 | Photopolymerizable presensitized plate and method for making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-24 | — | — | EP | disclosed |
| US-20030124364-A1 | Support for lithographic printing plate and presensitized plate | FUJIFILM CORPORATION (JP) | 2003-07-03 | — | — | US | disclosed |
| EP-1293579-A2 | Support for lithographic printing plate and presensitized plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-19 | — | — | EP | disclosed |
| EP-1288722-A2 | Method for preparing lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-1273971-A2 | Process for photopolymerization by exposure of a photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |
| EP-1273972-A1 | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate and method for preparing lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |