SCHEMBL130275

SCHEMBL130275

C=CC1(O)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4417953 0.97 ALDH1A1 (0.33)
SCHEMBL4416531 0.97 ALDH1A1 (0.33)
SCHEMBL4416587 0.97 ALDH1A1 (0.33)
SCHEMBL4419210 0.97 ALDH1A1 (0.33)
SCHEMBL4416520 0.97 ALDH1A1 (0.33)
SCHEMBL4416288 0.97 ALDH1A1 (0.33)
SCHEMBL4418854 0.97 ALDH1A1 (0.33)
SCHEMBL493926 0.97
SCHEMBL21869877 0.97 ALDH1A1 (0.33)
SCHEMBL132084 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4328363-A Manufacture of gamma halogen substituted adducts MOBIL OIL CORPORATION (US) 1982-05-04 US claimed
US-11920104-B2 Ethers and esters of 1-substituted cycloalkanols for use as aroma chemicals BASF SE (DE) 2024-03-05 US disclosed
US-20230152693-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-18 US disclosed
EP-3919980-A1 ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-12-08 EP disclosed
US-20210340461-A1 ETHERS AND ESTERS OF 1-SUBSTITUTED CYCLOALKANOLS FOR USE AS AROMA CHEMICALS BASF SE (DE) 2021-11-04 US disclosed
US-20210163387-A1 ONE-STEP FLOW-MEDIATED SYNTHESIS OF CANNABIDIOL (CBD) AND DERIVATIVES TRUSTEES OF BOSTON UNIVERSITY (US) 2021-06-03 US disclosed
CN-112867704-A Ethers and esters of 1-substituted cycloalkanols as fragrance chemicals 巴斯夫欧洲公司 2021-05-28 CN disclosed
US-10981850-B2 One-step flow-mediated synthesis of cannabidiol (CBD) and derivatives TRUSTEES OF BOSTON UNIVERSITY (US) 2021-04-20 US disclosed
US-20210096465-A1 POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-04-01 US disclosed
US-20210055656-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-02-25 US disclosed
EP-0695301-B1 INDOLE DERIVATIVES AS 5-HT1-LIKE AGONISTS FOR USE IN MIGRAINE PFIZER LTD (GB) 1996-10-30 EP disclosed
CN-1121348-A Indole derivatives as 5-H1-like agonists for use in migraine PFIZER RES & DEV (IE) 1996-04-24 CN disclosed
EP-0695301-A1 INDOLE DERIVATIVES AS 5-H1-LIKE AGONISTS FOR USE IN MIGRAINE PFIZER LTD (GB) 1996-02-07 EP disclosed
WO-1994024127-A1 INDOLE DERIVATIVES AS 5-H1-LIKE AGONISTS FOR USE IN MIGRAINE PFIZER LIMITED (GB) 1994-10-27 WO disclosed
US-4328363-A Manufacture of gamma halogen substituted adducts MOBIL OIL CORPORATION (US) 1982-05-04 US disclosed
EP-0001980-B1 PROCESS FOR THE PREPARATION OF HALOGENOVINYL-GAMMA-BUTYROLACTONES, INTERMEDIATES THEREFOR AND THEIR PREPARATION BAYER AG (DE) 1981-05-06 EP disclosed
US-4215050-A Preparation of halogenovinyl-γ-butyrolactones BAYER AKTIENGESELLSCHAFT (DE) 1980-07-29 US disclosed
EP-0001980-A1 Process for the preparation of halogenovinyl-gamma-butyrolactones, intermediates therefor and their preparation BAYER AG (DE) 1979-05-30 EP disclosed
US-3962105-A LUBRICATING COMPOSITIONS THE LUBRIZOL CORPORATION (US) 1976-06-08 US disclosed
US-3953518-A Process for preparing γ, δ-unsaturated carbonyl compounds HOFFMANN-LA ROCHE INC. (US) 1976-04-27 US disclosed