SCHEMBL13027508

SCHEMBL13027508

C#CO[Si](CCc1cc(C)c(C)c(C)c1)(OC#C)OC#C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027521 0.88 TNKS2 (0.33) —
SCHEMBL13027499 0.84 — —
SCHEMBL13027506 0.83 CNR1 (0.34) —
SCHEMBL13027626 0.81 HTR2A (0.35) —
SCHEMBL13027490 0.81 — —
SCHEMBL13027517 0.79 HRH3 (0.36) —
SCHEMBL13027489 0.78 MAPT (0.42) —
SCHEMBL13027602 0.77 CYP19A1 (0.42) —
SCHEMBL13027389 0.77 TUBB1 (0.32) —
SCHEMBL13027511 0.76 CYP1A2 (0.41) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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