SCHEMBL13027490

SCHEMBL13027490

C#CO[Si](CCc1cc(C)cc(C)c1C)(OC#C)OC#C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027517 0.85 HRH3 (0.36) —
SCHEMBL13027531 0.83 ACHE (0.34) —
SCHEMBL13027545 0.83 ACHE (0.31) —
SCHEMBL13027508 0.81 — —
SCHEMBL13027510 0.81 TAAR1 (0.47) —
SCHEMBL13027500 0.81 PYCR1 (0.43) —
SCHEMBL13027499 0.80 — —
SCHEMBL13027378 0.80 TAAR1 (0.30) —
SCHEMBL13027494 0.78 NPSR1 (0.32) —
SCHEMBL13027501 0.77 P2RX7 (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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