SCHEMBL13027489

SCHEMBL13027489

C#CO[Si](CCc1ccc(OC)c(C)c1)(OC#C)OC#C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 3/20 0.42
▸ ALDH1A1 P00352 2/20 0.42
▸ KMT2A Q03164 2/20 0.42
▸ MEN1 O00255 1/20 0.42
▸ RECQL P46063 1/20 0.42
▸ HTT P42858 2/20 0.41
▸ HPGD P15428 1/20 0.41
▸ GAA P10253 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ CRHBP P24387 2/20 0.40
▸ CRHR2 Q13324 2/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ ATM Q13315 2/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ DBH P09172 1/20 0.37
▸ CYP1A2 P05177 2/20 0.36
▸ CYP3A4 P08684 2/20 0.36
▸ POLB P06746 1/20 0.36
▸ CYP19A1 P11511 1/20 0.36
▸ CYP2D6 P10635 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027555 0.88 ATM (0.38) MAPTKMT2AMAPK1ATMKDM4E
SCHEMBL13027628 0.88 ATM (0.51) MAPTALDH1A1KMT2AATMKDM4E
SCHEMBL13027506 0.84 CNR1 (0.34) MAPTHTTPOLB
SCHEMBL13027380 0.84 MAPT (0.48) MAPTALDH1A1KMT2AMEN1RECQL
SCHEMBL13027521 0.82 TNKS2 (0.33) —
SCHEMBL13027626 0.80 HTR2A (0.35) KMT2AMEN1ATMKDM4ECYP19A1
SCHEMBL15672378 0.79 ALDH1A1 (0.44) MAPTALDH1A1KMT2AMEN1RECQL
SCHEMBL13027508 0.78 — —
SCHEMBL13027614 0.78 TAAR1 (0.53) MAPTALDH1A1KMT2AMEN1GAA
SCHEMBL13027607 0.77 HTR2A (0.50) KMT2AMEN1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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