SCHEMBL13027628

SCHEMBL13027628

C#CO[Si](CCc1ccc(OC)c(OC)c1)(OC#C)OC#C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ATM Q13315 2/20 0.51
▸ KDM4E B2RXH2 2/20 0.51
▸ POLB P06746 1/20 0.49
▸ CYP19A1 P11511 1/20 0.49
▸ CYP1A2 P05177 1/20 0.49
▸ CYP3A4 P08684 1/20 0.49
▸ CYP2D6 P10635 1/20 0.49
▸ CA2 P00918 2/20 0.49
▸ MAPT P10636 1/20 0.48
▸ BLM P54132 1/20 0.47
▸ PMP22 Q01453 1/20 0.47
▸ KMT2A Q03164 1/20 0.47
▸ AOC3 Q16853 1/20 0.46
▸ STAT3 P40763 1/20 0.45
▸ CA12 O43570 1/20 0.44
▸ CA1 P00915 1/20 0.44
▸ CA9 Q16790 1/20 0.44
▸ ALDH1A1 P00352 2/20 0.43
▸ GLA P06280 1/20 0.43
▸ LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027489 0.88 MAPT (0.42) ATMKDM4EPOLBCYP19A1CYP1A2
SCHEMBL13027555 0.88 ATM (0.38) ATMKDM4EPOLBCYP19A1CYP1A2
SCHEMBL13027477 0.83 ATM (0.61) ATMKDM4EPOLBCYP19A1CYP1A2
SCHEMBL13027607 0.83 HTR2A (0.50) CYP19A1CA2KMT2AAOC3CA12
SCHEMBL13027626 0.83 HTR2A (0.35) ATMKDM4ECYP19A1CA2KMT2A
SCHEMBL13027521 0.79 TNKS2 (0.33) —
SCHEMBL13027609 0.79 TAAR1 (0.47) KDM4EAOC3LMNA
SCHEMBL13027506 0.78 CNR1 (0.34) POLBMAPTLMNA
SCHEMBL15672358 0.78 ATM (0.54) ATMKDM4EPOLBCYP19A1CYP1A2
SCHEMBL13027608 0.78 CYP19A1 (0.41) CYP19A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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