Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AOC3 | Q16853 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.30 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.30 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027600 | 0.86 | AOC3 (0.48) | AOC3CYP1A2CHRM2SLC6A4OPRD1 | |
| SCHEMBL13027594 | 0.84 | CA12 (0.34) | — | |
| SCHEMBL13027454 | 0.83 | AOC3 (0.38) | AOC3CYP1A2CHRM2SLC6A4OPRD1 | |
| SCHEMBL13027536 | 0.82 | — | — | |
| SCHEMBL13027611 | 0.82 | CA12 (0.45) | CYP1A2 | |
| SCHEMBL13027540 | 0.79 | LMNA (0.32) | — | |
| SCHEMBL13027532 | 0.79 | — | — | |
| SCHEMBL13027539 | 0.78 | — | — | |
| SCHEMBL15672357 | 0.78 | AOC3 (0.34) | AOC3CYP1A2CHRM2SLC6A4OPRD1 | |
| SCHEMBL13027607 | 0.76 | HTR2A (0.50) | AOC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |