SCHEMBL13027540

SCHEMBL13027540

C#CO[Si](CCc1c(C)cccc1OC)(OC#C)OC#C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 2/20 0.32
▸ MAPT P10636 2/20 0.32
▸ PKM P14618 2/20 0.32
▸ NPC1 O15118 1/20 0.32
▸ POLB P06746 1/20 0.32
▸ G6PD P11413 1/20 0.32
▸ NQO2 P16083 1/20 0.32
▸ RAB9A P51151 1/20 0.32
▸ EIF2AK1 Q9BQI3 1/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ GAA P10253 1/20 0.31
▸ HSD17B10 Q99714 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.31
▸ MTNR1B P49286 1/20 0.31
▸ CA12 O43570 1/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA2 P00918 1/20 0.31
▸ CA4 P22748 1/20 0.31
▸ CA7 P43166 1/20 0.31
▸ CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027594 0.91 CA12 (0.34) LMNAMAPTNQO2SMN1; SMN2HSD17B10
SCHEMBL13027497 0.88 TAAR1 (0.31) TAAR1
SCHEMBL13027428 0.84 CA12 (0.37) LMNAMAPTPKMNPC1POLB
SCHEMBL13027532 0.82 — —
SCHEMBL13027486 0.82 TAAR1 (0.36) MAPTMTNR1BTAAR1
SCHEMBL13027536 0.82 — —
SCHEMBL13027624 0.80 TAAR1 (0.50) MAPTGAAMTNR1BCA12CA1
SCHEMBL13027547 0.79 SCN8A (0.32) LMNAMAPTHSD17B10CA12CA1
SCHEMBL13027611 0.79 CA12 (0.45) POLBRAB9ASMN1; SMN2GAAKDM4E
SCHEMBL13027535 0.79 ACHE (0.34) MAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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