SCHEMBL13042486

SCHEMBL13042486

C=CS(=O)(=O)CC(=O)NCCCCNC(=O)CS(=O)(=O)C=C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.41
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ZDHHC20 Q5W0Z9 1/20 0.37
ZDHHC2 Q9UIJ5 1/20 0.37
CASP2 P42575 1/20 0.35
MAPT P10636 2/20 0.33
KDM4E B2RXH2 2/20 0.33
TSHR P16473 1/20 0.33
NAAA Q02083 1/20 0.33
MAPK1 P28482 1/20 0.33
HIF1A Q16665 1/20 0.33
POLB P06746 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13042487 0.98 SMN1; SMN2 (0.45) SMN1; SMN2ALDH1A1MEN1KMT2AZDHHC20
SCHEMBL5145542 0.96 SMN1; SMN2 (0.37) SMN1; SMN2ALDH1A1MEN1KMT2AZDHHC20
SCHEMBL259273 0.91 TSHR (0.31) SMN1; SMN2ALDH1A1MEN1KMT2AMAPT
Ethane SCHEMBL2815456 0.88 ALDH1A1 (0.32) ALDH1A1MEN1KMT2A
SCHEMBL1335532 0.86
Propane SCHEMBL6761944 0.86 MEN1 (0.35) ALDH1A1MEN1KMT2AZDHHC20ZDHHC2
SCHEMBL28452262 0.84 ALDH1A1 (0.34) SMN1; SMN2ALDH1A1KDM4ETSHRLMNA
SCHEMBL1939866 0.83 TSHR (0.41) SMN1; SMN2ALDH1A1MAPTTSHRMAPK1
SCHEMBL17617949 0.82
Ethylene SCHEMBL28882625 0.82 ALDH1A1 (0.33) ALDH1A1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8383330-B2 Pattern exposure method and pattern exposure apparatus FUJIFILM CORPORATION (JP) 2013-02-26 US disclosed
US-7829270-B2 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel FUJIFILM CORPORATION (JP) 2010-11-09 US disclosed
US-20090268186-A1 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
US-20090017277-A1 comprising a support; and an emulsion layer containing a silver salt emulsion, the photosensitive material being capable of forming a conductive metal film by exposing and developing the emulsion layer, wherein the emulsion layer has a swelling rate of 150% or more FUJIFILM CORPORATION (JP) 2009-01-15 US disclosed
US-20070236764-A1 SILVER HALIDE HOLOGRAHIC SENSITIVE MATERIAL AND SYSTEM FOR TAKING HOLOGRAHIC IMAGES BY USING THE SAME FUJIFILM CORPORATION 2007-10-11 US disclosed
US-7241564-B2 Silver halide holographic sensitive material and system for taking holographic images by using the same FUJIFILM CORPORATION (JP) 2007-07-10 US disclosed
US-20070134559-A1 Hologram production method and hologram production system employing silver halide photosensitive material FUJIFILM CORPORATION (JP) 2007-06-14 US disclosed