⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30209840 | 0.88 | ALDH1A1 (0.32) | — | |
| SCHEMBL4976985 | 0.83 | MAPK1 (0.31) | — | |
| SCHEMBL14087706 | 0.83 | — | — | |
| SCHEMBL27009892 | 0.81 | POLB (0.30) | — | |
| SCHEMBL14494530 | 0.81 | ALDH1A1 (0.36) | — | |
| SCHEMBL30455603 | 0.80 | — | — | |
| SCHEMBL30209989 | 0.80 | — | — | |
| SCHEMBL29325980 | 0.80 | TSHR (0.30) | — | |
| SCHEMBL22105340 | 0.80 | — | — | |
| SCHEMBL27009905 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| US-7678528-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-03-16 | — | — | US | disclosed |
| US-7678528-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-03-16 | — | — | US | disclosed |
| US-7601480-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | disclosed |
| US-7601480-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | disclosed |
| US-7547501-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-16 | — | — | US | disclosed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | disclosed |
| US-20080058542-A1 | Photoactive Compounds | RAHMAN M D | 2008-03-06 | — | — | US | disclosed |
| US-20080058542-A1 | Photoactive Compounds | RAHMAN M D | 2008-03-06 | — | — | US | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |