SCHEMBL13044367

SCHEMBL13044367

CC(=O)O/N=C/c1ccc(N(C)C)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.64
KDM4E B2RXH2 6/20 0.64
MAPT P10636 6/20 0.64
GAA P10253 1/20 0.64
KMT2A Q03164 6/20 0.61
NPC1 O15118 5/20 0.61
MEN1 O00255 4/20 0.61
RAB9A P51151 4/20 0.61
POLB P06746 2/20 0.57
SMN1; SMN2 Q16637 5/20 0.56
GRIN2D O15399 2/20 0.51
GRIN3B O60391 2/20 0.51
GRIN1 Q05586 2/20 0.51
GRIN2A Q12879 2/20 0.51
GRIN2B Q13224 2/20 0.51
GRIN2C Q14957 2/20 0.51
GRIN3A Q8TCU5 2/20 0.51
HSD17B3 P37058 1/20 0.51
TP53 P04637 2/20 0.49
HSD17B10 Q99714 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL212328 0.82 ALDH1A1 (0.58) ALDH1A1KDM4EMAPTGAAKMT2A
SCHEMBL212327 0.82 ALDH1A1 (0.58) ALDH1A1KDM4EMAPTGAAKMT2A
SCHEMBL11406474 0.79 MIF (0.49) ALDH1A1KDM4EMAPTKMT2AMEN1
SCHEMBL13044374 0.79 PLA2G7 (0.61) NPC1RAB9ASMN1; SMN2GRIN2DGRIN3B
SCHEMBL213322 0.78 PLA2G7 (0.65) ALDH1A1KDM4EKMT2ANPC1MEN1
SCHEMBL213321 0.78 PLA2G7 (0.65) ALDH1A1KDM4EKMT2ANPC1MEN1
SCHEMBL13044340 0.77 KMT2A (0.57) MAPTGAAKMT2ANPC1MEN1
SCHEMBL13078401 0.76 ALDH1A1 (0.47) ALDH1A1KDM4EMAPTGAAKMT2A
SCHEMBL2841838 0.76 ALDH1A1 (0.57) ALDH1A1KDM4EMAPTGAAKMT2A
SCHEMBL2841840 0.76 ALDH1A1 (0.57) ALDH1A1KDM4EMAPTGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7829257-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. (US) 2010-11-09 US disclosed
US-7829257-B2 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. (US) 2010-11-09 US disclosed