SCHEMBL13053702

SCHEMBL13053702

C=C(C)C(=O)OC(C)OC(=O)C(C)C(=O)OC1C2CC3C(=O)OC1(C)C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11960973 0.83
SCHEMBL685122 0.83
SCHEMBL12868920 0.79
SCHEMBL685668 0.78 ALDH1A1 (0.33)
SCHEMBL10016729 0.78 PPARG (0.32)
SCHEMBL12705184 0.77
SCHEMBL10027345 0.77 ALDH1A1 (0.32)
SCHEMBL10061185 0.75 ABCB1 (0.32)
SCHEMBL10027342 0.75
SCHEMBL10061982 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7847045-B2 Acrylic acid-based polymer and method of producing the same NIPPON SODA CO., LTD. (JP) 2010-12-07 US disclosed
US-7494759-B2 Positive resist compositions and process for the formation of resist patterns with the same TOKYO OHKA KOGYO CO., LTD. (JP) 2009-02-24 US disclosed