Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.57 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.49 |
| ▸ | NAAA | Q02083 | 2/20 | 0.45 |
| ▸ | PAM | P19021 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.44 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5710039 | 0.85 | DGKA (0.61) | DGKADNM1NAAAPAM | |
| SCHEMBL9425559 | 0.82 | DGKA (0.57) | DGKADNM1NAAAPAMMEN1 | |
| SCHEMBL11690569 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11698384 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11696782 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11694373 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11694807 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11698016 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11697169 | 0.81 | DGKA (0.65) | DGKADNM1NAAAPAMLMNA | |
| SCHEMBL11698265 | 0.80 | DGKA (0.62) | DGKADNM1NAAAPAM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |