SCHEMBL13059481

SCHEMBL13059481

CC(C(=O)OC(C)(C)C)C(C)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
KMT2A Q03164 4/20 0.43
MAPT P10636 5/20 0.41
NPSR1 Q6W5P4 4/20 0.41
MEN1 O00255 3/20 0.41
ALDH1A1 P00352 3/20 0.41
RECQL P46063 3/20 0.41
CTSK P43235 3/20 0.40
AAK1 Q2M2I8 1/20 0.40
CTSS P25774 1/20 0.40
HCAR2 Q8TDS4 1/20 0.40
AOC3 Q16853 1/20 0.40
MAPK1 P28482 2/20 0.38
POLB P06746 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL127388 0.86 ATM (0.44) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL27342092 0.84 ATM (0.42) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL27331415 0.84 ATM (0.42) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL10699210 0.83 DPP4 (0.42) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL2289610 0.81 APP (0.47) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL16782694 0.81 APP (0.47) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL7599076 0.80 MME (0.41) ATML3MBTL1KMT2AMAPTNPSR1
SCHEMBL14626670 0.79 KMT2A (0.62) L3MBTL1KMT2AMAPTMEN1ALDH1A1
SCHEMBL25836630 0.79 KMT2A (0.62) L3MBTL1KMT2AMAPTMEN1ALDH1A1
SCHEMBL7043298 0.79 L3MBTL1 (0.55) ATML3MBTL1KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7842452-B2 Pattern forming method FUJIFILM CORPORATION (JP) 2010-11-30 US disclosed
US-7611820-B2 Positive resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2009-11-03 US disclosed
US-20090123880-A1 PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-05-14 US disclosed
US-7482112-B2 Pattern forming method FUJIFILM CORPORATION (JP) 2009-01-27 US disclosed
US-20070172768-A1 Pattern forming method FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-20070072121-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070059639-A1 Positive resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed