Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14215563 | 0.91 | KDM4E (0.41) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL12250184 | 0.89 | KDM4E (0.43) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL9923986 | 0.74 | TSHR (0.31) | HSD17B10TSHR | |
| SCHEMBL14099241 | 0.72 | KDM4E (0.42) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL12973914 | 0.72 | KDM4E (0.48) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL47499 | 0.72 | ALDH1A1 (0.48) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL10191599 | 0.71 | KDM4E (0.43) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL10075015 | 0.71 | KDM4E (0.43) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL13061703 | 0.71 | KDM4E (0.45) | KDM4EALDH1A1HPGDHSD17B10POLB | |
| SCHEMBL26453016 | 0.71 | KDM4E (0.47) | KDM4EALDH1A1HPGDHSD17B10POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7851127-B2 | Polymer compound, positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-14 | — | — | US | disclosed |
| US-20090162784-A1 | POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |