Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10947768 | 0.80 | MEN1 (0.35) | SLC6A3MEN1KMT2A | |
| SCHEMBL18073443 | 0.75 | — | — | |
| SCHEMBL92305 | 0.72 | SLC6A3 (0.33) | SLC6A3MEN1KMT2A | |
| SCHEMBL13183273 | 0.67 | — | — | |
| SCHEMBL18922826 | 0.67 | MEN1 (0.34) | SLC6A3MEN1KMT2A | |
| SCHEMBL3203981 | 0.66 | — | — | |
| SCHEMBL9697313 | 0.65 | SLC6A3 (0.38) | SLC6A3MEN1KMT2A | |
| SCHEMBL18487484 | 0.64 | — | — | |
| SCHEMBL475578 | 0.64 | — | — | |
| SCHEMBL92249 | 0.63 | SLC6A3 (0.37) | SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858670-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20100026771-A1 | INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-7375145-B2 | capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20070270520-A1 | Capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound | RISO TECHNOLOGIES CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070185224-A1 | PHOTOSENSITIVE INKJET INK | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-08-09 | — | — | US | disclosed |